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Final Report, 1998-1999 NIST/SEMATECH Collaboration for Improvement of High-Accuracy Critical-Dimension Meetrology for Semiconductor Manufacturing

Published

Author(s)

Andras Vladar, Michael T. Postek

Abstract

Beginning on or about January 15, 1999, researchers at the National Institute of Standards and Technology (NIST) received partial support from ISEMATECH to collaborate in a mutually defined program designated 1998-1999 NIST/ISEMATECH Collaboration for Improvement of High-Accuracy Critical-Dimension Metrology for Semiconductor Manufacturing.  The purpose of this program was for NIST to collaborate with ISEMATECH on the Advanced Metrology Advisory Group and to apply its metrology knowledge to selected ISEMATECH metrology applications and issues.  This work drew upon expertise from the Precision Engineering Division (PED) of NIST.  Collaboration and technology transfer with Spectel Company, a supplier to the industry, was also involved in a portion of this work.
Citation
NIST/SEMATECH Proprietary Document

Keywords

metrology, modeling, research material, scanning electron microscope, sharpness, standard reference material

Citation

Vladar, A. and Postek, M. (1999), Final Report, 1998-1999 NIST/SEMATECH Collaboration for Improvement of High-Accuracy Critical-Dimension Meetrology for Semiconductor Manufacturing, NIST/SEMATECH Proprietary Document (Accessed April 24, 2024)
Created December 14, 1999, Updated February 19, 2017