Vladar, A.
and Postek, M.
(1999),
Final Report, 1998-1999 NIST/SEMATECH Collaboration for Improvement of High-Accuracy Critical-Dimension Meetrology for Semiconductor Manufacturing, NIST/SEMATECH Proprietary Document
(Accessed October 7, 2024)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Final Report, 1998-1999 NIST/SEMATECH Collaboration for Improvement of High-Accuracy Critical-Dimension Meetrology for Semiconductor Manufacturing
Published
Author(s)
,
Abstract
Beginning on or about January 15, 1999, researchers at the National Institute of Standards and Technology (NIST) received partial support from ISEMATECH to collaborate in a mutually defined program designated 1998-1999 NIST/ISEMATECH Collaboration for Improvement of High-Accuracy Critical-Dimension Metrology for Semiconductor Manufacturing. The purpose of this program was for NIST to collaborate with ISEMATECH on the Advanced Metrology Advisory Group and to apply its metrology knowledge to selected ISEMATECH metrology applications and issues. This work drew upon expertise from the Precision Engineering Division (PED) of NIST. Collaboration and technology transfer with Spectel Company, a supplier to the industry, was also involved in a portion of this work.Citation
NIST/SEMATECH Proprietary Document
Pub Type
Others
Keywords
metrology, modeling, research material, scanning electron microscope, sharpness, standard reference material
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created December 14, 1999, Updated February 19, 2017