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Unified Advanced CD-SEM specification for Sub-0.18um Technology (1999 Version)

Published

Author(s)

J Allgair, C Archie, W Banke, H Bogardus, A Delaporte, Michael T. Postek, J Schlesinger, B Singh, Andras Vladar, A Yanof

Abstract

The Advanced Metrology Advisory Group (AMAG) comprised of representatives from: the International SEMATECH (ISEMATECH) consortium member companies; the National Institute of Standards and Technology; and ISEMATECH assignees have joined to develop a unified specification for an advanced scanning electron microscope critical dimension measurement instrument (CDSEM).  The current document embodies this common CDSEM specification.
Citation
Unified Advanced CD-SEM specification for Sub-0.18um Technology (1999 Version) (SEMATECH Technical Transfer Document)

Keywords

contamination, critical dimension, instrument performance, linewidth, scanning electron microscope, standards, wafer

Citation

Allgair, J. , Archie, C. , Banke, W. , Bogardus, H. , Delaporte, A. , Postek, M. , Schlesinger, J. , Singh, B. , Vladar, A. and Yanof, A. (2000), Unified Advanced CD-SEM specification for Sub-0.18um Technology (1999 Version), Unified Advanced CD-SEM specification for Sub-0.18um Technology (1999 Version) (SEMATECH Technical Transfer Document) (Accessed May 19, 2024)

Issues

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Created January 30, 2000, Updated October 12, 2021