Allgair, J.
, Archie, C.
, Banke, W.
, Bogardus, H.
, Delaporte, A.
, Postek, M.
, Schlesinger, J.
, Singh, B.
, Vladar, A.
and Yanof, A.
(2000),
Unified Advanced CD-SEM specification for Sub-0.18um Technology (1999 Version), Unified Advanced CD-SEM specification for Sub-0.18um Technology (1999 Version) (SEMATECH Technical Transfer Document)
(Accessed October 12, 2025)
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Unified Advanced CD-SEM specification for Sub-0.18um Technology (1999 Version)
Published
Author(s)
J Allgair, C Archie, W Banke, H Bogardus, A Delaporte, , J Schlesinger, B Singh, , A Yanof
Abstract
The Advanced Metrology Advisory Group (AMAG) comprised of representatives from: the International SEMATECH (ISEMATECH) consortium member companies; the National Institute of Standards and Technology; and ISEMATECH assignees have joined to develop a unified specification for an advanced scanning electron microscope critical dimension measurement instrument (CDSEM). The current document embodies this common CDSEM specification.Citation
Unified Advanced CD-SEM specification for Sub-0.18um Technology (1999 Version) (SEMATECH Technical Transfer Document)
Pub Type
Others
Keywords
contamination, critical dimension, instrument performance, linewidth, scanning electron microscope, standards, wafer
Citation
Issues
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Created January 30, 2000, Updated October 12, 2021