Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Potentials of Online Scanning Electron Microscope Performance Analysis Using NIST Reference Material 8091

Published

Author(s)

Michael T. Postek, Andras Vladar, Nien F. Zhang, Robert D. Larrabee

Abstract

Fully automated scanning electron microscopes (SEM) are now commonly used in semiconductor production and other forms of manufacturing. Testing and proving that the instrument is performing at a satisfactory level of sharpness is an important aspect of quality control. In industrial applications, such as automated on-line semiconductor production, users of scanning electron microscope (SEM) metrology instruments would like to have these instruments function without human intervention for long periods of time, and to have some simple criterion (or indication) of when they need servicing or other attention. Currently, no self-testing is incorporated into the majority of these instruments to verify that the instrument is operating at a satisfactory performance level. Therefore, there is a growing realization of the need for the development of a procedure for periodic performance testing. A degradation of the sharpness of the image of a suitable test object can serve as, of perhaps several, indicators of the need for maintenance.
Proceedings Title
Metrology, Inspection, and Process Control for Microlithography, Conference | 14th | | SPIE
Conference Dates
February 28-March 2, 2000
Conference Title
Proceedings of SPIE--the International Society for Optical Engineering

Keywords

kurtosis, research material, scanning electron microscope, SEM monitor, standards

Citation

Postek, M. , Vladar, A. , Zhang, N. and Larrabee, R. (2000), Potentials of Online Scanning Electron Microscope Performance Analysis Using NIST Reference Material 8091, Metrology, Inspection, and Process Control for Microlithography, Conference | 14th | | SPIE (Accessed March 1, 2024)
Created March 1, 2000, Updated February 19, 2017