Is a Production-Level Scanning Electron Microscope Linewidth Standard Possible?

Published

June 1, 2000

Author(s)

Michael T. Postek, Andras Vladar, John S. Villarrubia

Abstract

Metrology will remain a principal enabler for the development and manufacture of future generations of semiconductor devices. With the potential of 130 and l00-nanometer linewidths and high aspect ratio structures, the scanning electron microscope (SEM) remains an important metrology tool. This instrument is also extensively used in many phases of semiconductor manufacturing throughout the world. A challenge was recently posed in an article in Semiconductor International, which was to have an accurate, production level, linewidth standard for critical dimension scanning electron microscopes available to the semiconductor industry. The potential for meeting this challenge are explored in this paper.

Proceedings Title

Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography XIV, Neal T. Sullivan, Editor

Volume

3998

Conference Dates

February 28, 2000

Conference Location

Santa Clara, CA, USA

Conference Title

Electrical Methods for CD Metrology

Pub Type

Conferences

Keywords

AFM, atomic force microscope, linewidth, polysilicon, scanning electron microscope, SRM, standard reference material

Citation

Postek, M. , Vladar, A. and Villarrubia, J. (2000), Is a Production-Level Scanning Electron Microscope Linewidth Standard Possible?, Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography XIV, Neal T. Sullivan, Editor, Santa Clara, CA, USA (Accessed October 9, 2025)