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Is a Production-Level Scanning Electron Microscope Linewidth Standard Possible?

Published

Author(s)

Michael T. Postek, Andras Vladar, John S. Villarrubia

Abstract

Metrology will remain a principal enabler for the development and manufacture of future generations of semiconductor devices. With the potential of 130 and l00-nanometer linewidths and high aspect ratio structures, the scanning electron microscope (SEM) remains an important metrology tool. This instrument is also extensively used in many phases of semiconductor manufacturing throughout the world. A challenge was recently posed in an article in Semiconductor International, which was to have an accurate, production level, linewidth standard for critical dimension scanning electron microscopes available to the semiconductor industry. The potential for meeting this challenge are explored in this paper.
Proceedings Title
Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography XIV, Neal T. Sullivan, Editor
Volume
3998
Conference Dates
February 28, 2000
Conference Location
Santa Clara, CA, USA
Conference Title
Electrical Methods for CD Metrology

Keywords

AFM, atomic force microscope, linewidth, polysilicon, scanning electron microscope, SRM, standard reference material

Citation

Postek, M. , Vladar, A. and Villarrubia, J. (2000), Is a Production-Level Scanning Electron Microscope Linewidth Standard Possible?, Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography XIV, Neal T. Sullivan, Editor, Santa Clara, CA, USA (Accessed June 10, 2023)
Created May 31, 2000, Updated October 12, 2021