@conference{756656,
  author = {Michael Postek and Andras Vladar and John Villarrubia},
  title = {Is a Production-Level Scanning Electron Microscope Linewidth Standard Possible?},
  year = {2000},
  number = {3998},
  month = {2000-06-01 00:06:00},
  publisher = {Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography XIV, Neal T. Sullivan, Editor, Santa Clara, CA, USA},
  language = {en},
}