TY  - CONF
AU  - Michael Postek
AU  - Andras Vladar
AU  - John Villarrubia
C2  - Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography XIV, Neal T. Sullivan, Editor, Santa Clara, CA, USA
DA  - 2000-06-01 00:06:00
LA  - en
M1  - 3998
PB  - Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography XIV, Neal T. Sullivan, Editor, Santa Clara, CA, USA
PY  - 2000
TI  - Is a Production-Level Scanning Electron Microscope Linewidth Standard Possible?
ER  -