Toward a Unified Advanced CD-SEM Specification for Sub 0.18 Micrometer Technology

Published

June 1, 1998

Author(s)

J Allgair, C Archie, W Banke, H Bogardus, J Griffith, H Marchman, Michael T. Postek, L Saraf, J Schlesinger, B Singh, N. Sullivan, L Trimble, Andras Vladar, A Yanof

Abstract

The stringent critical dimension (CD) control requirements in cutting edge device facilities have placed significant demands on metrologists and upon the tools they use. We are developing a unified, advanced critical dimension scanning electron microscope (CD-SEM) specification in the interests of providing a unified criterion of performance and testing. The specification is grounded on standard definitions and strong principles of metrology. The current revision is to be published as a SEMATECH document. A new revision, now in progress, will embody the consensus of a vendor/user conference.

Proceedings Title

Proceedings of SPIE

Volume

3332

Conference Dates

February 23, 1998

Conference Location

Santa Clara, CA, USA

Conference Title

Metrology, Inspection, and Process Control for Microlithography XII, Bhanwar Singh, Editor

Pub Type

Conferences

Keywords

accuracy, charging, contamination, critical dimension, metrology, pattern recotnition, precision, scanning electron microscope, specification

Citation

Allgair, J. , Archie, C. , Banke, W. , Bogardus, H. , Griffith, J. , Marchman, H. , Postek, M. , Saraf, L. , Schlesinger, J. , Singh, B. , Sullivan, N. , Trimble, L. , Vladar, A. and Yanof, A. (1998), Toward a Unified Advanced CD-SEM Specification for Sub 0.18 Micrometer Technology, Proceedings of SPIE, Santa Clara, CA, USA (Accessed October 9, 2025)