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Search Publications by: Andras E. Vladar (Fed)

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Displaying 176 - 190 of 190

Is Your Scanning Electron Microscope Hi-Fi?

December 7, 1996
Author(s)
Andras Vladar, Michael T. Postek, S Davilla
The scanning electron microscope (SEM) historically has been used mainly as an image-producing device and, in spite of certain obvious and sometimes serious electronics problems, serves in this function as an acceptable and effective instrument for many

High-Accuracy Critical-Dimension Metrology Using a Scanning Electron Microscope

May 1, 1996
Author(s)
J R. Lowney, Andras Vladar, Michael T. Postek
Two Monte Carlo computer codes have been written to simulate the transmitted-, backscattered-, and secondary-electron signals from targets in a scanning electron microscope. The first discussed, MONSEL-II, is applied to semi-infinite lines produced

SEM Performance Evaluation Using the Sharpness Criterion

May 1, 1996
Author(s)
Michael T. Postek, Andras Vladar
Fully automated or semi-automated scanning electron microscopes (SEM) are now commonly used in semiconductor production and other forms of manufacturing. The industry requires that an automated instrument must be routinely capable of 5 nm resolution (or

Models for Relating Scanning Electron Microscopy Images to Measured Artifacts

April 1, 1996
Author(s)
Michael T. Postek, Andras Vladar, J R. Lowney
A specific example of a technique we developed to enhance the information obtained from SEM images is the extraction of an approximate profile corresponding to an electron beam with zero beam diameter from one with a finite beam diameter. Results were

Digital Imaging for Scanning Electron Microscopy

January 1, 1996
Author(s)
Michael T. Postek, Andras Vladar
The development and application of digital imaging technology has been one of the major advancements in scanning electron microscopy (SEM) during the past several years. This digital revolution has been brought about by significant progress in

SEM Image Sharpness Analysis

January 1, 1996
Author(s)
Michael T. Postek, Andras Vladar
The technique described here, utilizing the sharpness concept, is facilitated by the use of the FFT techniques to analyze the electron micrograph to obtain the evaluation. This is not the first application of Fourier techniques to SEM images, but it is the

A Monte Carlo Model for SEM Linewidth Metrology

May 1, 1994
Author(s)
J R. Lowney, Michael T. Postek, Andras Vladar
A scanning electron microscope (SEM) can be used to measure the dimensions of the microlithographic features of integrated circuits. However, without a good model of the electron-beam / specimen interaction, accurate edge location cannot be obtained. A
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