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Electron Beam Interaction Modeling as Applied to X-Ray Lithography Mask SEM Linewidth Metrology

Published

Author(s)

Michael T. Postek, J R. Lowney, Andras Vladar, William J. Keery, E Marx, Robert D. Larrabee
Citation
Scanning
Volume
16
Issue
IV

Citation

Postek, M. , Lowney, J. , Vladar, A. , Keery, W. , Marx, E. and Larrabee, R. (1994), Electron Beam Interaction Modeling as Applied to X-Ray Lithography Mask SEM Linewidth Metrology, Scanning (Accessed June 14, 2024)

Issues

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Created December 30, 1994, Updated October 12, 2021