TY  - JOUR
AU  - Michael Postek
AU  - J Lowney
AU  - Andras Vladar
AU  - William Keery
AU  - E Marx
AU  - Robert Larrabee
C2  - Scanning
DA  - 1994-12-31 00:12:00
LA  - en
M1  - 16
PB  - Scanning
PY  - 1994
TI  - Electron Beam Interaction Modeling as Applied to X-Ray Lithography Mask SEM Linewidth Metrology
ER  -