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X-Ray Mask Metrology: The Development of Linewidth Standards for X-Ray Lithography

Published

Author(s)

Michael T. Postek, J R. Lowney, Andras Vladar, William J. Keery, E Marx, Robert D. Larrabee
Proceedings Title
Proc. Intl. Soc. for Optical Engineering (SPIE), International Society for Optical Engineering, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III
Conference Dates
March 1-2, 1993
Conference Location
San Jose, CA, USA

Citation

Postek, M. , Lowney, J. , Vladar, A. , Keery, W. , Marx, E. and Larrabee, R. (1993), X-Ray Mask Metrology: The Development of Linewidth Standards for X-Ray Lithography, Proc. Intl. Soc. for Optical Engineering (SPIE), International Society for Optical Engineering, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III, San Jose, CA, USA (Accessed July 20, 2024)

Issues

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Created December 30, 1993, Updated October 12, 2021