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PUBLICATIONS

X-Ray Mask Metrology: The Development of Linewidth Standards for X-Ray Lithography

Published

Author(s)

Michael T. Postek, J R. Lowney, Andras Vladar, William J. Keery, E Marx, Robert D. Larrabee
Proceedings Title
Proc. Intl. Soc. for Optical Engineering (SPIE), International Society for Optical Engineering, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III
Conference Dates
March 1-2, 1993
Conference Location
San Jose, CA, USA
Pub Type
Conferences

Citation

Postek, M. , Lowney, J. , Vladar, A. , Keery, W. , Marx, E. and Larrabee, R. (1993), X-Ray Mask Metrology: The Development of Linewidth Standards for X-Ray Lithography, Proc. Intl. Soc. for Optical Engineering (SPIE), International Society for Optical Engineering, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III, San Jose, CA, USA (Accessed December 16, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created December 30, 1993, Updated October 12, 2021