TY  - CONF
AU  - Michael Postek
AU  - J Lowney
AU  - Andras Vladar
AU  - William Keery
AU  - E Marx
AU  - Robert Larrabee
C2  - Proc. Intl. Soc. for Optical Engineering (SPIE), International Society for Optical Engineering, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III, San Jose, CA, USA
DA  - 1993-12-31 00:12:00
LA  - en
PB  - Proc. Intl. Soc. for Optical Engineering (SPIE), International Society for Optical Engineering, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III, San Jose, CA, USA
PY  - 1993
TI  - X-Ray Mask Metrology: The Development of Linewidth Standards for X-Ray Lithography
ER  -