@conference{769536,
  author = {Michael Postek and J Lowney and Andras Vladar and William Keery and E Marx and Robert Larrabee},
  title = {X-Ray Mask Metrology: The Development of Linewidth Standards for X-Ray Lithography},
  year = {1993},
  month = {1993-12-31 00:12:00},
  publisher = {Proc. Intl. Soc. for Optical Engineering (SPIE), International Society for Optical Engineering, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III, San Jose, CA, USA},
  language = {en},
}