Lowney, J.
, Vladar, A.
and Postek, M.
(1996),
High-Accuracy Critical-Dimension Metrology Using a Scanning Electron Microscope, Proc. Intl. Soc. for Optical Engineering (SPIE), The International Society for Optical Engineering, Metrology Inspection and Process Control for Microlithography X, Santa Clara, CA, USA
(Accessed October 11, 2025)
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High-Accuracy Critical-Dimension Metrology Using a Scanning Electron Microscope
Published
Author(s)
, ,
Proceedings Title
Proc. Intl. Soc. for Optical Engineering (SPIE), The International Society for Optical Engineering, Metrology Inspection and Process Control for Microlithography X
Volume
2725
Conference Dates
March 11-13, 1995
Conference Location
Santa Clara, CA, USA
Pub Type
Conferences
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact [email protected].
Created December 30, 1996, Updated October 12, 2021