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High-Accuracy Critical-Dimension Metrology Using a Scanning Electron Microscope

Published

Author(s)

J R. Lowney, Andras Vladar, Michael T. Postek
Proceedings Title
Proc. Intl. Soc. for Optical Engineering (SPIE), The International Society for Optical Engineering, Metrology Inspection and Process Control for Microlithography X
Volume
2725
Conference Dates
March 11-13, 1995
Conference Location
Santa Clara, CA, USA

Citation

Lowney, J. , Vladar, A. and Postek, M. (1996), High-Accuracy Critical-Dimension Metrology Using a Scanning Electron Microscope, Proc. Intl. Soc. for Optical Engineering (SPIE), The International Society for Optical Engineering, Metrology Inspection and Process Control for Microlithography X, Santa Clara, CA, USA (Accessed July 18, 2024)

Issues

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Created December 30, 1996, Updated October 12, 2021