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A Monte Carlo Model for SEM Linewidth Metrology

Published

Author(s)

J R. Lowney, Michael T. Postek, Andras Vladar
Proceedings Title
Proc. Intl. Soc. for Optical Engineering (SPIE), Integrated Circuit Metrology, Inspection, and Process Control VIII
Volume
2196
Conference Location
San Jose, CA, USA

Citation

Lowney, J. , Postek, M. and Vladar, A. (1994), A Monte Carlo Model for SEM Linewidth Metrology, Proc. Intl. Soc. for Optical Engineering (SPIE), Integrated Circuit Metrology, Inspection, and Process Control VIII, San Jose, CA, USA (Accessed May 28, 2024)

Issues

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Created December 30, 1994, Updated October 12, 2021