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X-Ray Lithography Mask Metrology: Use of Transmitted Electrons in an SEM for Linewidth Measurement

Published

Author(s)

Michael T. Postek, J R. Lowney, Andras Vladar, William J. Keery, E Marx, Robert D. Larrabee
Citation
Journal of Research (NIST JRES) -

Citation

Postek, M. , Lowney, J. , Vladar, A. , Keery, W. , Marx, E. and Larrabee, R. (1993), X-Ray Lithography Mask Metrology: Use of Transmitted Electrons in an SEM for Linewidth Measurement, Journal of Research (NIST JRES), National Institute of Standards and Technology, Gaithersburg, MD (Accessed April 20, 2024)
Created July 31, 1993, Updated October 12, 2021