Postek, M.
, Lowney, J.
, Vladar, A.
, Keery, W.
, Marx, E.
and Larrabee, R.
(1993),
X-Ray Lithography Mask Metrology: Use of Transmitted Electrons in an SEM for Linewidth Measurement, Journal of Research (NIST JRES), National Institute of Standards and Technology, Gaithersburg, MD
(Accessed December 8, 2024)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
X-Ray Lithography Mask Metrology: Use of Transmitted Electrons in an SEM for Linewidth Measurement
Published
Author(s)
, , , , E Marx,
Citation
Journal of Research (NIST JRES) -
NIST Pub Series
Pub Type
NIST Pubs
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created July 31, 1993, Updated October 12, 2021