@misc{766321,
  author = {Michael Postek and J Lowney and Andras Vladar and William Keery and E Marx and Robert Larrabee},
  title = {X-Ray Lithography Mask Metrology: Use of Transmitted Electrons in an SEM for Linewidth Measurement},
  year = {1993},
  month = {1993-08-01 00:08:00},
  publisher = {Journal of Research (NIST JRES), National Institute of Standards and Technology, Gaithersburg, MD},
  language = {en},
}