Workshop Report 1: Scanning Electron Microscope Metrology as Related to a Defined Edge Structure

Published

January 1, 1995

Author(s)

Michael T. Postek, Andras Vladar, G Banke, T Reilly

Abstract

An accurate electron beam model is primary to the understanding of the SEM image. Several independently developed Monte Carlo models have been introduced for this purpose and a modeling round-robin has just been conducted to compare the results of these models for a rudimentary 1??m step in a silicon wafer. A companion round-robin based on a similar physical structure was also performed to compare measurements from the SEM relative to the theoretical results. This presentation reports on the basics of the SEM-imaging portion of the round-robin and the measurement experiments performed on the sample. This work is a consequence of the Electron-Beam Modeling Workshop held in conjunction with the 1994 Scanning Meeting in Charleston, SC.

Proceedings Title

Proceedings MAS

Conference Location

Breckinridge, CO, USA

Pub Type

Conferences

Citation

Postek, M. , Vladar, A. , Banke, G. and Reilly, T. (1995), Workshop Report 1: Scanning Electron Microscope Metrology as Related to a Defined Edge Structure, Proceedings MAS, Breckinridge, CO, USA (Accessed May 8, 2026)

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