Workshop Report 1: Scanning Electron Microscope Metrology as Related to a Defined Edge Structure
Michael T. Postek, Andras Vladar, G Banke, T Reilly
An accurate electron beam model is primary to the understanding of the SEM image. Several independently developed Monte Carlo models have been introduced for this purpose and a modeling round-robin has just been conducted to compare the results of these models for a rudimentary 1??m step in a silicon wafer. A companion round-robin based on a similar physical structure was also performed to compare measurements from the SEM relative to the theoretical results. This presentation reports on the basics of the SEM-imaging portion of the round-robin and the measurement experiments performed on the sample. This work is a consequence of the Electron-Beam Modeling Workshop held in conjunction with the 1994 Scanning Meeting in Charleston, SC.
, Vladar, A.
, Banke, G.
and Reilly, T.
Workshop Report 1: Scanning Electron Microscope Metrology as Related to a Defined Edge Structure, Proceedings MAS, Breckinridge, CO, USA
(Accessed December 4, 2023)