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Final Report, 1997-1998 NIST/SEMATECH Collaboration for Improvement of High-Accuracy Critical-dimension Metrology for Semiconductor Manufacturing

Published

Author(s)

Andras Vladar, Michael T. Postek

Abstract

Beginning on or about April 1, 1997, the National Institute of Standards and Technology (NIST) received partial support from SEMATECH to collaborate in a program designated 1997-1998 NIST/SEMATECH Collaboration for Improvement of High-Accuracy Critical-Dimension Metrology for Semiconductor Manufacturing. The purpose of this program was for NIST to apply its metrology knowledge to selected SEMATECH metrology applications and issues. This work drew upon the expertise and personnel from two divisions at NIST: the Precision Engineering Division and the Semiconductor Electronics Division. Collaboration and technology transfer with Spectel Company, a supplier to the industry, was also involved in a portion of this work.
Citation
NIST/SEMATECH Proprietary Document

Keywords

backscattered electron, metrology, modeling, monte carlo, scanning electron microscope, secondary electron

Citation

Vladar, A. and Postek, M. (1998), Final Report, 1997-1998 NIST/SEMATECH Collaboration for Improvement of High-Accuracy Critical-dimension Metrology for Semiconductor Manufacturing, NIST/SEMATECH Proprietary Document (Accessed April 15, 2024)
Created March 30, 1998, Updated February 19, 2017