Vladar, A.
and Postek, M.
(1998),
Final Report, 1997-1998 NIST/SEMATECH Collaboration for Improvement of High-Accuracy Critical-dimension Metrology for Semiconductor Manufacturing, NIST/SEMATECH Proprietary Document
(Accessed October 26, 2025)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Final Report, 1997-1998 NIST/SEMATECH Collaboration for Improvement of High-Accuracy Critical-dimension Metrology for Semiconductor Manufacturing
Published
Author(s)
,
Abstract
Beginning on or about April 1, 1997, the National Institute of Standards and Technology (NIST) received partial support from SEMATECH to collaborate in a program designated 1997-1998 NIST/SEMATECH Collaboration for Improvement of High-Accuracy Critical-Dimension Metrology for Semiconductor Manufacturing. The purpose of this program was for NIST to apply its metrology knowledge to selected SEMATECH metrology applications and issues. This work drew upon the expertise and personnel from two divisions at NIST: the Precision Engineering Division and the Semiconductor Electronics Division. Collaboration and technology transfer with Spectel Company, a supplier to the industry, was also involved in a portion of this work.Citation
NIST/SEMATECH Proprietary Document
Pub Type
Others
Keywords
backscattered electron, metrology, modeling, monte carlo, scanning electron microscope, secondary electron
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact [email protected].
Created March 30, 1998, Updated February 19, 2017