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Fourier Transform Feedback for Scanning Electron Microscopes Used in Semiconductor Metrology

Published

Author(s)

Michael T. Postek, Andras Vladar, M P. Davidson

Abstract

The utility of the sharpness concept for use on metrology scanning electron microscopes (SEM) as implemented through the Fourier transform technique has been clearly demonstrated and documented. The original methods for sharpness analysis were labor-intensive and, therefore, not suited to industrial applications like the semiconductor integrated circuit production. We have integrated these techniques into an easy to use and stand alone software package called SEMMON which makes the analysis easy and, moreover, can serve as a prototype for integration into a production tool. This paper will present the general philosophy of the system and analytical data taken from both laboratory and production instruments to prove both the relevance of the sharpness concept and the usefulness of this tool for SEM performance monitoring.
Proceedings Title
Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography XI, Susan K. Jones, Editor
Volume
3050
Conference Dates
March 10, 1997
Conference Location
Santa Clara, CA, USA
Conference Title
Scanning Probe Metrology I

Keywords

Fourier, image analysis, metrology, performance, resolution, scanning electron microscope, sharpness

Citation

Postek, M. , Vladar, A. and Davidson, M. (1997), Fourier Transform Feedback for Scanning Electron Microscopes Used in Semiconductor Metrology, Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography XI, Susan K. Jones, Editor, Santa Clara, CA, USA (Accessed March 1, 2024)
Created June 30, 1997, Updated October 12, 2021