Bradley N. Damazo, Andras Vladar, Alice V. Ling, M A. Donmez, Michael T. Postek, Crossley E. Jayewardene
This paper describes the design and implementation of a system for monitoring the performance of a critical dimension measurement scanning electron microscope (CD-SEM). Experiments were performed for tests involving diagnosis of the vacuum system and column stability by monitoring of the following subsystems and associated functional parameters. These include:1) Vacuum system with pressure as a function of time being recorded for the electron-optical column (gun chamber), the specimen chamber, and the sample-loading unit.2) The action of several components of the wafer handling system can be timed. 3) The electron gun emission currents and other signals to monitor the characteristics of the condenser and objective lenses may be used to correlate with image quality.4) Image sharpness, electron beam current, signal-to-noise ratio, etc. can be evaluated.
Metrology, Inspection, and Process Control for Microlithography XV, Conference |15th | Metrology, Inspection, and Process Control for Microlithography XV | SPIE
February 26-March 2, 2001
Proceedings of SPIE--the International Society for Optical Engineering
auromatic, computer control, monitoring, performance, SEM
, Vladar, A.
, Ling, A.
, Donmez, M.
, Postek, M.
and Jayewardene, C.
SEM Sentinel - SEM Performance Measurement System, Metrology, Inspection, and Process Control for Microlithography XV, Conference |15th | Metrology, Inspection, and Process Control for Microlithography XV | SPIE
(Accessed December 10, 2023)