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Nanotechnology

Nanofabrication/manufacturing

Tools and Instruments

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NanoFab Tool: Plasma Therm Corial ICP HBr Cl Etcher

The Plasma Therm Corial ICP HBr Cl etcher is an inductively coupled plasma (ICP) reactive ion etching system. The high-power plasma source combined with low

NanoFab Tool: Plasma Therm Corial Deep Silicon Etcher

The Plasma-Therm deep silicon etcher is an inductively coupled plasma (ICP) reactive ion etching system used for etching deep features in silicon. The tool uses

NanoFab Tool: Plasma-Therm Versaline High Density Plasma Enhanced Chemical Vapor Deposition (HD-PECVD)

The Plasma-Therm Versaline high density plasma enhanced chemical vapor deposition (HD-PECVD) system uses an inductively coupled plasma to remotely ionize

NanoFab Tool: Raith EBPG 5200+ Electron Beam Lithography

The Raith EBPG 5200+ direct write electron beam lithography system allows users to quickly and directly pattern a variety of substrate materials with features

NanoFab Tool: Reactive Ion Etcher Oxford RIE PlasmaPro 80

The Oxford RIE PlasmaPro 80 etcher is a versatile parallel plate plasma etching system which uses ionized fluorocarbon and oxygen gases to etch Si, SiO2 and

Photograph of the Unaxis 790 reactive ion etcher.

NanoFab Tool: Reactive Ion Etcher Unaxis 790 Middle

The Unaxis 790 reactive ion etcher (RIE) is a general purpose parallel plate plasma etching system which uses ionized fluorocarbon gases and oxygen to etch

Photograph of the Reynolds Tech silicon nitride etch wet bench.

NanoFab Tool: Reynolds Tech Silicon Nitride Etch Wet Bench

The Reynolds Tech silicon nitride etch wet bench uses dilute phosphoric acid to preferentially etch silicon nitride on silicon. The process is used to define

NanoFab Tool: Sandvik LPCVD Amorphous and Polycrystalline Silicon

The Sandvik low pressure chemical vapor deposition (LPCVD) polysilicon furnaces supports amorphous and polycrystalline silicon deposition in the NanoFab. The

NanoFab Tool: Specialty Coating Systems PDS 2010 Parylene Deposition System

The Specialty Coating Systems PDS 2010 parylene deposition system provides users with reliable and repeatable conformal parylene coatings ranging from 75

Photograph of the SPTS Etch hydrofluoric acid vapor etcher

NanoFab Tool: SPTS microEtch Hydrofluoric Acid Vapor Etcher

The SPTS µEtch is a single wafer hydrofluoric acid vapor etcher used to release silicon microstructures in microelectromechanical systems (MEMS) devices. It

NanoFab Tool: SUSS HMX Square 9 Automatic Mask Develop Cr-etch

The SUSS HMX square system is a single photomask, automated wet chemical processing tool. It first uses a TMAH-based developer to dissolve lithographically

Schematic of the Suss MicroTec ACS200 Resist Coat System

NanoFab Tool: Suss MicroTec ACS200 Automated Resist Coater

The Suss MicroTec ACS200 is an automated photoresist coating and baking station with cassette-to-cassette substrate operation. It supports both spin coating and

Schematic of the Suss MicroTec Delta12 Developer System.

NanoFab Tool: Suss MicroTec Delta12AQ Automated Resist Developer

The Suss MicroTec Delta12AQ is an automated photoresist developer station which supports temperature controlled spray photoresist development. The cassette-to

NanoFab Tool: Suss MicroTec MA/BA6 Gen4 Mask Aligner

The SUSS MicroTec MA/BA6 contact aligner allows users to align patterns on the front or back of a substrate and to print feature sizes down to 1 µm. The tool

Image: Pelco Easiglow Glow Discharge Cleaning System

NanoFab Tool: Ted Pella easiGlow Glow Discharge Cleaning System

The PELCO easiGlow Glow Discharge Cleaning System is primarily designed to clean and functionalize transmission electron microscopy carbon support films. A glow

NanoFab Tool: Toho Technology FLX-2320 Stress Measurement Tool

The Toho Technology FLX-2320 stress measurement tool uses a laser interferometer to measure the curvature of a wafer before and after film deposition. It then

Photograph of the Tousimis Automegasamdri-916B Series C critical point dryer.

NanoFab Tool: Tousimis Automegasamdri-916B Series C

The Tousimis Supercritical Automegasamdri-916B Series C critical point dryer uses liquid carbon dioxide (LCO 2) to dry substrates in a controlled manner in

Photograph of the Xactix Xetch xenon difluoride silicon etcher.

NanoFab Tool: Xactix Xetch Xenon Difluoride Silicon Etcher

The Xactix Xetch is a single wafer tool which isotropically etches silicon using vapor phase xenon difluoride. The xenon difluoride etch process provides high

NanoFab Tool: Zeiss Gemini 500 Field Emission Scanning Electron Microscope

The Zeiss Gemini 500 Field Emission Scanning Electron Microscope (FE-SEM) is a high resolution FE-SEM which provides nanoscale imaging from 100 mm diameter

Photograph of the Zeiss NVision 40 Cross Beam Microscope.

NanoFab Tool: Zeiss Ultra 60 Field Emission Scanning Electron Microscope

The Zeiss Ultra 60 Field Emission Scanning Electron Microscope (FE-SEM) is a high resolution FE-SEM which provides nanoscale imaging and compositional analysis

Photograph of the 4Wave IBE-20B ion milling system.

NanoFab Tool: 4Wave IBE-20B Ion Milling System

The 4Wave IBE-20B ion milling system uses a broad argon ion beam to controllably and uniformly remove material from a user's substrate. A secondary ion mass

NanoFab Tool: ABM Mask Contact Aligner

The ABM contact aligner allows users to align patterns on the front or back of a substrate and to print feature sizes down to 800 nm. The tool offers vacuum

NanoFab Tool: ADT 7132 Dicing Saw

The ADT 7132 dicing saw is used to cut multi-device substrates into individual chips. The system can accommodate substrates up to 1 mm thick and supports sizes

NanoFab Tool: AllWin21 Downstream Asher

The AllWin21 Downstream plasma asher uses heat and exposure to downstream oxygen radicals to remove resist and other organic materials. The cassette load system

NanoFab Tool: AnnealSys RTA

The AnnealSys model AS-Master is a single wafer rapid thermal process system supports anneal processing in the NanoFab cleanroom. This tools supports anneals

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