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NanoFab Tool: Suss MicroTec Delta12AQ Automated Resist Developer

Schematic of the Suss MicroTec Delta12 Developer System.

The Suss MicroTec Delta12AQ is an automated photoresist developer station which supports temperature controlled spray photoresist development. The cassette-to-cassette substrate operation provides a "dry in – dry out" process on a variety of substrates using standard developer chemistries.

Specifications/Capabilities

  • Recipe controlled automated operation.
  • Precise control of developer temperature.
  • Supported developer chemistries:
    • AZ400K.
    • AZ300MIF.
    • CD26.

Usage Information

Supported Sample Sizes

  • Maximum wafer diameter: 200 mm (8 in).
  • Small pieces supported: No.
  • Maximum substrate thickness: 5 mm.
  • Wafer diameters supported:
    • 50 mm (2 in).
    • 75 mm (3 in).
    • 100 mm (4 in).
    • 150 mm (6 in).
    • 200 mm (8 in).
  • Photomask sizes supported:
    • 125 mm x 125 mm.
    • 150 mm x 150 mm.

Typical Applications

  • Photoresist development after optical exposure.
Created May 7, 2014, Updated November 21, 2019