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NanoFab Tool: Suss MicroTec Delta12AQ Automated Resist Developer
The Suss MicroTec Delta12AQ is an automated photoresist developer station which supports temperature controlled spray photoresist development. The cassette-to-cassette substrate operation provides a "dry in – dry out" process on a variety of substrates using standard developer chemistries.
Specifications/Capabilities
- Recipe controlled automated operation.
- Precise control of developer temperature.
- Supported developer chemistries:
- AZ400K.
- AZ300MIF.
- CD26.
Usage Information
Supported Sample Sizes
- Maximum wafer diameter: 200 mm (8 in).
- Small pieces supported: No.
- Maximum substrate thickness: 5 mm.
- Wafer diameters supported:
- 50 mm (2 in).
- 75 mm (3 in).
- 100 mm (4 in).
- 150 mm (6 in).
- 200 mm (8 in).
- Photomask sizes supported:
- 125 mm x 125 mm.
- 150 mm x 150 mm.
Typical Applications
- Photoresist development after optical exposure.
Created May 7, 2014, Updated February 24, 2023