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NanoFab Tool: Xactix Xetch Xenon Difluoride Silicon Etcher

Photograph of the Xactix Xetch xenon difluoride silicon etcher.

The Xactix Xetch is a single wafer tool which isotropically etches silicon using vapor phase xenon difluoride. The xenon difluoride etch process provides high selectivity to silicon oxide, silicon nitride, and photoresist masks. The tool can accommodate substrates ranging from 150 mm diameter wafers down to small pieces.

Specifications/Capabilities

  • Etch selectivity:
    • Silicon to silicon dioxide: = 100 to 1.
    • Silicon to silicon nitride: = 100 to 1.
    • Silicon to photoresist: = 60 to 1.
  • Unique gases: xenon difluoride.

Usage Information

Supported Sample Sizes

  • Maximum wafer diameter: 150 mm (6 in).
  • Small pieces supported: Yes.

Typical Applications

  • Microelectromechanical systems (MEMS).
  • Nanoelectromechanical systems (NEMS).
  • Accelerometers.
  • Pressure sensors.
Created June 22, 2014, Updated December 4, 2019