Skip to main content
U.S. flag

An official website of the United States government

Dot gov

The .gov means it’s official.
Federal government websites often end in .gov or .mil. Before sharing sensitive information, make sure you’re on a federal government site.

Https

The site is secure.
The https:// ensures that you are connecting to the official website and that any information you provide is encrypted and transmitted securely.

NanoFab Tool: Suss MicroTec ACS200 Automated Resist Coater

Schematic of the Suss MicroTec ACS200 Resist Coat System

The Suss MicroTec ACS200 is an automated photoresist coating and baking station with cassette-to-cassette substrate operation. It supports both spin coating and spray coating of photoresist on a variety of substrates. The tool provides complete resist coating capabilities, including hotplate baking up to 250 °C and automated edge-bead removal with backside rinse.

Specifications/Capabilities

  • Gyrset spin coat & Alta spray coat modules.
  • 250 °C programmable hotplate.
  • Automated edge-bead removal and back side rinse.

Usage Information

Supported Sample Sizes

  • Maximum wafer diameter: 200 mm (8 in).
  • Small pieces supported: Yes.
  • Maximum substrate thickness: 5 mm.
  • Wafer diameters supported:
    • 50 mm (2 in).
    • 75 mm (3 in).
    • 100 mm (4 in).
    • 150 mm (6 in).
    • 200 mm (8 in).
  • Photomask sizes supported:
    • 125 mm x 125 mm.
    • 150 mm x 150 mm.

Typical Applications

  • Photoresist coating for optical pattern exposure.
  • Photoresist coating for mask production.
Created May 7, 2014, Updated October 19, 2018