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Search Publications by: John D. Gillaspy (Fed)

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Displaying 101 - 125 of 157

Laboratory Astrophysics and Microanalysis With NTD-Germanium-Based X-Ray Microcalorimeters

January 1, 2000
Author(s)
E Silver, H. Schnopper, Simon R. Bandler, S Murray, N. Madden, D Landis, J. Beeman, E. E. Haller, M Barbera, G Tucker, John D. Gillaspy, E Takacs, James V. Porto
With the ability to create cosmic plasma conditions in the laboratory it is possible to investigate the dependencies of key diagnostic x-ray lines on density, temperature, and excitation conditions that exist in astrophysical sources with x-ray optics and

Exposure of Self-Assembled Monolayers to Highly Charged Ions and Metastable Ions

July 1, 1999
Author(s)
L P. Ratliff, Ronaldo Minniti, A Bard, E W. Bell, John D. Gillaspy, D Parks, A J. Black, G M. Whitesides
The doses of neutral metastable argon atoms (Ar*) and highly charged xenon ions (HCIs) required to damage self-assembled monolayers (SAMs) of alkanethiolates on gold are compared in a set of experiments carried out concurrently. The extent of damage to the

Masked Ion Beam Lithography with Highly Charged Ions

September 1, 1998
Author(s)
John D. Gillaspy, D Parks, L P. Ratliff
Masked ion beam lithography using highly charged ions is demonstrated for the first time by producing an array of hundreds of ordered micrometer wide dots using Xe 44+ on Poly(Methylmrthacrylate) resist. At low dose exposure of the resist is incomplete and

Self-Assembled Monolayers Exposed by Metastable Argon and Metastable Helium for Neutral Atom Lithography and Atomic Beam Imaging

September 1, 1997
Author(s)
A Bard, K K. Berggren, J L. Wilbur, John D. Gillaspy, S L. Rolston, Jabez J. McClelland, William D. Phillips, M Prentiss, G M. Whitesides
We used a beam of noble gas atoms in a metastable excited state to expose a thin (1.5nm self-assembled monolayer resist applied over a gold-coated silicon wafer. We determined exposure damage as a function of dose of metastable atoms by processing the
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