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Search Publications by: John D. Gillaspy (Fed)

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Displaying 126 - 150 of 157

Microlithography by Using Neutral Metastable Atoms and Self-Assembled Monolayers

September 1, 1995
Author(s)
K K. Berggren, A Bard, J L. Wilbur, John D. Gillaspy, A G. Helg, Jabez J. McClelland, S Rolston, William D. Phillips, M Prentiss, G M. Whitesides
Lithography can be performed with beams of neutral atoms in metastable excited states to pattern self-assembled monolayers (SAMs) of alkanethiolates on gold. An estimated exposure of a SAM of dodecanethiolate (DDT) to 15 to 20 metastable argon atoms per

Overview of the EBIT Program at NIST

January 1, 1995
Author(s)
John D. Gillaspy, Y Aglitskiy, E W. Bell, C M. Brown, Christopher T. Chantler, R Deslattes, Uri Feldman, Lawrence T. Hudson, J M. Laming, E S. Meyer, C A. Morgan, A I. Pikin, J R. Roberts, L P. Ratliff, F. G. Serpa, J Sugar, E Takacs

The NIST EBIT; A Progress Report

January 1, 1993
Author(s)
John D. Gillaspy, J R. Roberts, Craig M. Brown, Uri Feldman
(1993 publication) The invention of the Electron Beam Ion Trap (EBIT) at Livermore has marked the emergence of a versatile new source for the spectroscopic study of highly charged ions. An EBIT can produce virtually any highly charged state of any atom on
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