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Microlithography by Using Neutral Metastable Atoms and Self-Assembled Monolayers

Published

Author(s)

K K. Berggren, A Bard, J L. Wilbur, John D. Gillaspy, A G. Helg, Jabez J. McClelland, S L. Rolston, William D. Phillips, M Prentiss, G M. Whitesides
Citation
Science
Volume
269

Citation

Berggren, K. , Bard, A. , Wilbur, J. , Gillaspy, J. , Helg, A. , McClelland, J. , Rolston, S. , Phillips, W. , Prentiss, M. and Whitesides, G. (1995), Microlithography by Using Neutral Metastable Atoms and Self-Assembled Monolayers, Science (Accessed April 15, 2024)
Created December 31, 1994, Updated October 12, 2021