Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Exposure of Self-Assembled Monolayers to Highly Charged Ions and Metastable Ions



L P. Ratliff, Ronaldo Minniti, A Bard, E W. Bell, John D. Gillaspy, D Parks, A J. Black, G M. Whitesides


The doses of neutral metastable argon atoms (Ar*) and highly charged xenon ions (HCIs) required to damage self-assembled monolayers (SAMs) of alkanethiolates on gold are compared in a set of experiments carried out concurrently. The extent of damage to the SAM is determined by developing the samples in a gold etching solution, then measuring the decrease in reflectivity of the gold; {approximately} 105 Ar* are required to cause the same amount of damage as 1 HCI, as measured by this assay. We have also demonstrated HCI micropatterning of a surface using a physical mask, suggesting the application of this system in lithography.
Applied Physics Letters
No. 4


dose, highly charged ions, metastable ions, patterning, self-assembled monolayers, surface


Ratliff, L. , Minniti, R. , Bard, A. , Bell, E. , Gillaspy, J. , Parks, D. , Black, A. and Whitesides, G. (1999), Exposure of Self-Assembled Monolayers to Highly Charged Ions and Metastable Ions, Applied Physics Letters (Accessed May 28, 2024)


If you have any questions about this publication or are having problems accessing it, please contact

Created July 1, 1999, Updated February 17, 2017