U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Search Publications by: Vivek M. Prabhu (Fed)

Search Title, Abstract, Conference, Citation, Keyword or Author
Displaying 76 - 100 of 223

Neutron reflectivity characterization of the photoacid reaction-diffusion latent and developed images of molecular resists for extreme-ultraviolet lithography

May 11, 2012
Author(s)
Vivek M. Prabhu, Shuhui Kang, Wen-Li Wu, Sushil K. Satija, Christopher K. Ober, Jing Sha, Peter V. Bonnesen
Lithographic feature size requirements have approached a few radius of gyration of chemically-amplified photoresist polymers used in thin film patterning. Further, the feature dimensions are commensurate with the photoacid diffusion length that defines the

Characterization of the non-uniform reaction in chemically-amplified calix[4]resorcinarene molecular resist thin films

July 19, 2011
Author(s)
Vivek M. Prabhu, Shuhui Kang, Regis J. Kline, Dean M. DeLongchamp, Daniel A. Fischer, Wen-Li Wu, Sushil K. Satija, Jing Sha, Christopher K. Ober, Peter V. Bonnesen
The ccc stereoisomer-purified tert-butoxycarbonyloxy (t-Boc) protected calix[4]resorcinarene molecular resists blended with photoacid generator exhibit a non-uniform photoacid catalyzed reaction in thin films. The surface displays a reduced reaction extent

Nanoelectronics Lithography

March 1, 2011
Author(s)
Stephen Knight, Vivek Prabhu, John H. Burnett, James Alexander Liddle, Christopher Soles, Alain C. Diebold
This is a compiled chapter that will be included into the Handbook of Nanophysics.

Zone-Refinement Effect in Small Molecule-Polymer Blend Semiconductors for Organic Thin Film Transistors

December 14, 2010
Author(s)
Yeon Sook Chung, Nayool Shin, Jihoon Kang, Youngeun Jo, Vivek Prabhu, Regis J. Kline, John E. Anthony, Do Y. Yoon
The blend films of small molecule semiconductors with insulating polymers exhibit not only an excellent solution processability, but also superior performance characteristics (field-effect mobility, on/off ratio, threshold voltage and stability) over those

Lateral Uniformity in Chemical Composition along a Buried Reaction Front in Polymers

November 15, 2010
Author(s)
Kristopher Lavery, Vivek Prabhu, Sushil K. Satija, Wen-Li Wu
Off-specular neutron reflectometry was applied to characterize the form and amplitude of lateral compositional variations at a buried reaction-diffusion front. In this work, off-specular neutron measurements were first calibrated using off-specular X-ray

Photoresist latent and developer images as probed by neutron reflectivity methods

September 16, 2010
Author(s)
Vivek M. Prabhu, Shuhui Kang, David L. VanderHart, Eric K. Lin, Wen-Li Wu
Photoresist materials enable the fabrication of advanced integrated circuits with ever decreasing feature sizes. As next-generation light sources are developed, using extreme ultraviolet light of wavelength 13.5 nm, these highly-tuned formulations must

Architectural Effects on Reaction-Diffusion Kinetics in Molecular Glass Photoresists

April 20, 2010
Author(s)
Vivek M. Prabhu, Shuhui Kang, Christopher L. Soles, Christopher K. Ober, Jing Sha, Jin-Kyun Lee, Peter V. Bonnesen
Understanding acid reaction-diffusion kinetics is crucial for controlling the lithographic performance of chemically amplified photoresists. In this work, we study how the molecular architectures of positive-tone chemically amplified molecular glass

Synthetic Mica: A Very Promising Substrate for Studying Solid Thin Films by Proton NMR

August 25, 2009
Author(s)
David L. VanderHart, Vivek M. Prabhu, Kristopher Lavery, Cindi L. Dennis
We demonstrate that a synthetic fluorophlogopite mica can be used as a proton-free, diamagnetic substrate for examining solid thin-film samples using conventional solid-state proton NMR experiments. The context of this work extends previous NMR studies on

Thin Film Solid State Proton NMR Measurements Using A Synthetic Mica Substrate: Polymer Blends

August 25, 2009
Author(s)
David L. VanderHart, Vivek Prabhu, Kristopher Lavery, Cindi L. Dennis, Ashwin Rao, Eric K. Lin
We demonstrate that a synthetic fluorophlogopite mica can be used as a proton-free, diamagnetic substrate for examining solid thin-film samples using conventional solid-state proton nuclear magnetic resonance (NMR) experiments. The context of this work
Was this page helpful?