Publications

Displaying 101 - 125 of 223

Thin Film Solid State Proton NMR Measurements Using A Synthetic Mica Substrate: Polymer Blends

August 25, 2009

Author(s)

David L. VanderHart, Vivek Prabhu, Kristopher Lavery, Cindi L. Dennis, Ashwin Rao, Eric K. Lin

We demonstrate that a synthetic fluorophlogopite mica can be used as a proton-free, diamagnetic substrate for examining solid thin-film samples using conventional solid-state proton nuclear magnetic resonance (NMR) experiments. The context of this work

Methodology for quantitative measurements of multilayer polymer thin films with IR spectroscopic ellipsometry

July 2, 2009

Author(s)

Shuhui Kang, Vivek Prabhu, Christopher Soles, Eric K. Lin, Wen-Li Wu

A new methodology to quantify the sensitivity and resolution of infrared variable angle spectroscopic ellipsometry (IRSE) measurements was developed for probing the depth profile of composition in thin polymer films. A multilayer system comprised of sub

Nanoparticle assembly, DNA provides control

May 1, 2009

Author(s)

Vivek M. Prabhu, Steven D. Hudson

No abstract this is a Nature Materials News and Views (less than 800 word) article.

Quantitative Measurement of the Polydispersity in the Extent of Functionalization of Glass Forming Resorcinarenes

May 1, 2009

Author(s)

William E. Wallace, Kathleen M. Flynn, Charles M. Guttman, David L. VanderHart, Vivek M. Prabhu, Anuja De Silva, Nelson Felix, Christopher K. Ober

The polydispersity in the degree of functionalization for two calix[4]resorcinarenes was determined by measuring their molecular mass distribution with matrix-assisted laser desorption/ionization time of flight mass spectrometry. A mathematical method for

Solid State NMR Investigation of Photoresist Molecular Glasses Including Blend Behavior With a Photoacid Generator

March 5, 2009

Author(s)

David L. VanderHart, Vivek M. Prabhu, Anuja De Silva, Nelson Felix, Christopher K. Ober

We have examined four molecular glass (MG) materials which show promise as photoresists for extreme ultraviolet (EUV) lithography. These glass-forming materials were investigated by both proton and 13C solid state nuclear magnetic resonance (NMR)

Solid State NMR Investigation of Photoresist Molecular Glasses Including Mixing Behavior With a Photoacid Generator

March 5, 2009

Author(s)

David L. VanderHart, Vivek M. Prabhu, Anuja De Silva, Nelson Felix, Christopher K. Ober

We have examined four model molecular glasses (MGs) which are candidates for extreme ultraviolet lithography. One rationale for employing MGs is that these materials, on the basis of being molecules smaller than the usual polymeric materials, might yield

Characterization of the Photoacid Diffusion Length

February 27, 2009

Author(s)

Shuhui Kang, Vivek Prabhu, Wen-Li Wu, Eric K. Lin, Kwang-Woo Choi, Manish Chandhok, Todd Younkin, Wang Yueh

The photoacid diffusion length is a critical issue for EUV photoresists and photolithography because it governs critical dimension (CD), line-edge-roughness (LER) and line-width-roughness (LWR). This paper provides an approach to characterize the photoacid

Fluorescence Correlation Spectroscopy Investigation of Growth Factor Dynamics in Three Dimensional Extracellular Matrices

October 16, 2008

Author(s)

Michael Weir, Chengqing C. Wang, Vivek Prabhu, Eric K. Lin, K Yamada, N Washburn

Fluorescence correlation spectroscopy was used to measure the binding and diffusion of growth factors in model extracellular matrices in order to investigate the importance of protein-matrix interactions in regulating signaling molecules within a three

Photoacid Generator Dispersion in Partially Fluorinated Photoresist Polymers and their Blends

October 16, 2008

Author(s)

David L. VanderHart, Vivek Prabhu

Solid state proton NMR methods are used to probe the intimacy of mixing in materials relevant to photoresist applications. Bulk blends, made solvent casting, consisted of partially fluorinated polymers and the photoacid generator, di(t-butylphenyl)iodonium

Manipulation of the asymmetric swelling fronts of photoresist polyelectrolyte gradient thin films

September 22, 2008

Author(s)

Vivek M. Prabhu, Ashwin Rao, Shuhui Kang, Eric K. Lin, Sushil K. Satija

The depth profile of swelling polyelectrolyte layers is characterized by a static substrate layer and an asymmetric profile with position and shape parameters that describe the near substrate and solution-side of the interfacial region. The characteristic

Structure and Properties of Small Molecule-Polymer Blend Semiconductors for Organic Thin Film Transistors

June 4, 2008

Author(s)

Vivek M. Prabhu, Jihoon Kang, Nayool Shin, Do Y. Yoon, Do Y. Jang

A comprehensive structural and electrical characterization of solution-processed blend films of 6,13-bis(triisopropylsilylethynyl)pentacene (TIPS-pentacene) and poly(alpha-methylstyrene) (PaMS) was performed to understand and optimize the blend

Characterization of the Latent Image to Developed Image in Model EUV Photoresists

February 22, 2008

Author(s)

John T. Woodward IV, Kwang-Woo Choi, Vivek Prabhu, Shuhui Kang, Kristopher Lavery, Wen-Li Wu, Michael Leeson, Anuja De Silva, Nelson Felix, Christopher K. Ober

Current extreme ultraviolet (EUV) photoresist materials do not yet meet exposure-dose sensitivity, line-width roughness, and resolution requirements. In order to quantify how trade-offs are related to the materials properties of the resist and processing

The Effect of EUV Molecular Glass Architecture on the Bulk Dispersion of a Photo-Acid Generator

February 22, 2008

Author(s)

David L. VanderHart, Vivek M. Prabhu, Anuja De Silva, Nelson Felix, Christopher K. Ober

We have examined four molecular glasses (MGs) which are candidates for EUV photoresist formulations. These derivatized glasses and their unprotected precursors were investigated by both 1H and 13C solid state NMR in the bulk state as pure materials and

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