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Proton NMR Determination of Miscibility in a Bulk Model Photoresist System: Poly(4-hydroxystyrene) and the Photoacid Generator, Di-(t-butylphenyl) Iodonium Perfluorooctanesulfonate

Published

Author(s)

David L. VanderHart, Vivek M. Prabhu, Eric K. Lin
Citation
Chemistry of Materials
Volume
16(16)

Keywords

Blends, Electronic Materials, Lithography, Microstructure, NMR, Spectroscopy, iodonium sulfonate, miscibility, photoacid generator, photoresist, poly(hydroxystyrene), proton, spin diffusion

Citation

VanderHart, D. , Prabhu, V. and Lin, E. (2004), Proton NMR Determination of Miscibility in a Bulk Model Photoresist System: Poly(4-hydroxystyrene) and the Photoacid Generator, Di-(t-butylphenyl) Iodonium Perfluorooctanesulfonate, Chemistry of Materials, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=853953 (Accessed August 1, 2021)
Created January 1, 2004, Updated February 17, 2017