Proton NMR Determination of Miscibility in a Bulk Model Photoresist System Poly (4-Hydroxystyene) and the Photoacid Generator, Di(t-butylphenyl) Iodonium Perfluorooctane Sulfonate

Published

July 13, 2004

Author(s)

David L. VanderHart, Vivek M. Prabhu, Eric K. Lin

Abstract

The intimacy of component mixing in 2 blends of poly(4-hydroxystyrene) (PHS) and a photoacid generator (PAG), di(t-butylphenyl) iodonium perfluorooctane sulfonate (PFOS) were studied by solid state proton NMR. Mass ratios were 91/9 and 85/15 PHS/PFOS. These are simplified model blends for certain photoresist formulations used in the electronics industry. Multiple-pulse NMR techniques are used in both spin-diffusion and longitudinal relaxation experiments at ambient temperatures. It is deduced that PFOS is mixed with PHS on a molecular scale for PFOS mass fractions at or below 0.15; hence, the 2 components are thermodynamically miscible in this range. An attempt was also made to support the notion of intimate PFOS/PHS mixing by looking for evidence of 1H-19F dipolar broadening in multiple-pulse blend spectra. This attempt was not successful owing to rapid polarization-exchange between 19F nuclei.

Citation

Chemistry of Materials

Volume

16

Issue

16

Pub Type

Journals

Download Paper

Local Download

Keywords

iodonium sulfonate, miscibility, NMR, photoresist, poly(hydroxystyrene) photoacid generator, proton spin diffusion

Citation

VanderHart, D. , Prabhu, V. and Lin, E. (2004), Proton NMR Determination of Miscibility in a Bulk Model Photoresist System Poly (4-Hydroxystyene) and the Photoacid Generator, Di(t-butylphenyl) Iodonium Perfluorooctane Sulfonate, Chemistry of Materials, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=852101 (Accessed October 20, 2025)