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Measurements of the Reaction-Diffusion Front of Model Chemically Amplified Photoresists With Varying Photoacid Size

Published

Author(s)

B D. Vogt, Shuhui Kang, Vivek Prabhu, Eric K. Lin, Sushil K. Satija, Karen Turnquest, Wen-Li Wu

Abstract

Neutron reflectivity and Fourier transform infrared spectroscopy measurements are used to profile the deprotection reaction-diffusion front with a nanometer resolution in a model photoresist polymer using three perfluoroalkane-based photoacid generators (PAG) with varying chain lengths. As expected, the spatial extent of the deprotection reaction front increases with decreasing PAG size. Although the total extent of deprotection increases with increasing PEB time for each PAG, the reaction-diffusion of deprotection does not propagate smoothly into the photoresist polymer.The form of the deprotection reaction front changes because the diffusion process is affected by the changing polymer composition. The data are well described by a reaction-diffusion model that includes a simple acid-trapping term and does not require a varying PAG diffusivity. This high resolution profiling of deprotection reaction front, together with theoretical modeling, illustrates details of the coupled diffusion and deprotection reaction processes that affect lithographic performance.
Citation
Macromolecules
Volume
39

Keywords

lithography, neutron reflectivity, photoresist, reaction-diffusion

Citation

Vogt, B. , Kang, S. , Prabhu, V. , Lin, E. , Satija, S. , Turnquest, K. and Wu, W. (2006), Measurements of the Reaction-Diffusion Front of Model Chemically Amplified Photoresists With Varying Photoacid Size, Macromolecules, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=852650 (Accessed June 15, 2024)

Issues

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Created October 25, 2006, Updated October 12, 2021