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Search Publications by: Vivek M. Prabhu (Fed)

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Displaying 51 - 75 of 113

Synthetic Mica: A Very Promising Substrate for Studying Solid Thin Films by Proton NMR

August 25, 2009
Author(s)
David L. VanderHart, Vivek M. Prabhu, Kristopher Lavery, Cindi L. Dennis
We demonstrate that a synthetic fluorophlogopite mica can be used as a proton-free, diamagnetic substrate for examining solid thin-film samples using conventional solid-state proton NMR experiments. The context of this work extends previous NMR studies on

Thin Film Solid State Proton NMR Measurements Using A Synthetic Mica Substrate: Polymer Blends

August 25, 2009
Author(s)
David L. VanderHart, Vivek Prabhu, Kristopher Lavery, Cindi L. Dennis, Ashwin Rao, Eric K. Lin
We demonstrate that a synthetic fluorophlogopite mica can be used as a proton-free, diamagnetic substrate for examining solid thin-film samples using conventional solid-state proton nuclear magnetic resonance (NMR) experiments. The context of this work

Quantitative Measurement of the Polydispersity in the Extent of Functionalization of Glass Forming Resorcinarenes

May 1, 2009
Author(s)
William E. Wallace, Kathleen M. Flynn, Charles M. Guttman, David L. VanderHart, Vivek M. Prabhu, Anuja De Silva, Nelson Felix, Christopher K. Ober
The polydispersity in the degree of functionalization for two calix[4]resorcinarenes was determined by measuring their molecular mass distribution with matrix-assisted laser desorption/ionization time of flight mass spectrometry. A mathematical method for

Characterization of the Photoacid Diffusion Length

February 27, 2009
Author(s)
Shuhui Kang, Vivek Prabhu, Wen-Li Wu, Eric K. Lin, Kwang-Woo Choi, Manish Chandhok, Todd Younkin, Wang Yueh
The photoacid diffusion length is a critical issue for EUV photoresists and photolithography because it governs critical dimension (CD), line-edge-roughness (LER) and line-width-roughness (LWR). This paper provides an approach to characterize the photoacid

Characterization of the Latent Image to Developed Image in Model EUV Photoresists

February 22, 2008
Author(s)
John T. Woodward IV, Kwang-Woo Choi, Vivek Prabhu, Shuhui Kang, Kristopher Lavery, Wen-Li Wu, Michael Leeson, Anuja De Silva, Nelson Felix, Christopher K. Ober
Current extreme ultraviolet (EUV) photoresist materials do not yet meet exposure-dose sensitivity, line-width roughness, and resolution requirements. In order to quantify how trade-offs are related to the materials properties of the resist and processing

Effect of Photoacid Generator Concentration and Developer Strength on the Patterning Capabilities of a Model EUV Photoresist

February 25, 2007
Author(s)
Kwang-Woo Choi, Vivek Prabhu, Kristopher Lavery, Eric K. Lin, Wen-Li Wu, John T. Woodward IV, Michael Leeson, H Cao, Manish Chandhok, George Thompson
Current extreme ultraviolet (EUV) photoresist materials do not yet meet requirements on exposure-dose sensitivity, line-width roughness (LWR), and resolution. Fundamental studies are required to quantify the trade-offs in materials properties and

Evaluation of the 3D Compositional Fluctuation Effect on Line-Edge-Roughness

February 25, 2007
Author(s)
Shuhui Kang, Wen-Li Wu, B D. Vogt, Vivek Prabhu, Eric K. Lin, Karen Turnquest
Line-edge-roughness (LER) and the relationship to resist processing and materials design is a critical problem for sub-65 nm photolithography. In this work we investigate how chemical composition fluctuations (heterogeneity) produced by the reaction

FTIR measurements of compositional heterogeneities

February 25, 2007
Author(s)
Shuhui Kang, B D. Vogt, Wen-Li Wu, Vivek Prabhu, David L. VanderHart, Ashwin Rao, Eric K. Lin, Karen Turnquest
A general approach to characterize compositional heterogeneity in polymer thin films using Fourier transform infrared (FTIR) spectroscopy has been demonstrated Polymer films with varying degrees of heterogeneity were prepared using a model chemically

Identifying Materials Limits of Chemically Amplified Photoresists

February 25, 2007
Author(s)
Wen-Li Wu, Vivek Prabhu, Eric K. Lin
Chemically amplified photoresists are likely to remain the primary imaging materials for the semiconductor industry. As feature sizes decrease to dimensions comparable to the characteristic size of the molecules in the photoresist, a significant challenge

Characterization of Compositional Heterogeneity in Chemically Amplified Photoresist Polymer Thin Films with Infrared Spectroscopy

February 9, 2007
Author(s)
Shuhui Kang, B D. Vogt, Vivek Prabhu, Eric K. Lin, Wen-Li Wu, David L. VanderHart, Ashwin Rao, Karen Turnquest
We demonstrate a general approach to characterize compositional heterogeneity in polymer thin films using Fourier transform infrared (FTIR) spectroscopy. Polymer films with varying degrees of heterogeneity were prepared using a model chemically amplified