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Lateral Length Scales of Latent Image Roughness as Determined by Off-Specular Neutron Reflectivity



Kristopher Lavery, Vivek Prabhu, Eric K. Lin, Wen-Li Wu, Sushil K. Satija, Kwang-Woo Choi, M Wormington


A combination of specular and off-specular neutron reflectometry was used to measure the buried lateral roughness of the reaction-diffusion front in a model extreme ultraviolet lithography photoresist. Compositional heterogeneity at the latent reaction-diffusion front has been proposed as a major cause of line edge roughness in photolithographic features. This work marks the first experimental observation of the longitudial and lateral compositional heterogeneity of a latent image, revealing the buried lateral length scale as well as the amplitude of inhomogeneity at the reaction-diffusion front. These measurements aid in determining the origins of line edge roughness formation, while exploring the materials limits of the current chemically amplified photoresists.
Applied Physics Letters


diffusion, line edge roughness, neutron reflectivity, off-specular reflectivity, photolithography


Lavery, K. , Prabhu, V. , Lin, E. , Wu, W. , Satija, S. , Choi, K. and Wormington, M. (2008), Lateral Length Scales of Latent Image Roughness as Determined by Off-Specular Neutron Reflectivity, Applied Physics Letters, [online], (Accessed June 15, 2024)


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Created February 13, 2008, Updated October 12, 2021