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Direct measurement of the spatial extent of the in situ developed latent image by neutron reflectivity

Published

Author(s)

Vivek M. Prabhu, B D. Vogt, Shuhui Kang, Eric K. Lin, Sushil K. Satija

Abstract

The spatial distribution of polymer photoresist and deuterium labeled base developer highlights a fraction of the line edge that swells but does not dissolve. This residual swelling fraction remains swollen during both the in situ aqueous hydroxide dissolution (Development) and water rinse steps uncovering that the final lithographic feature is resolved by a collapse mechanism during the drying step. These new insights into the mechanism of lithographic feature formation were enabled by contrast variant neutron reflectivity methods with nanometer resolution.
Citation
Journal of Vacuum Science and Technology B
Volume
25
Issue
6

Keywords

chemically amplified photoresists, diffusioin, neutron reflectivity, photolithography, swelling

Citation

Prabhu, V. , Vogt, B. , Kang, S. , Lin, E. and Satija, S. (2007), Direct measurement of the spatial extent of the in situ developed latent image by neutron reflectivity, Journal of Vacuum Science and Technology B, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=852747 (Accessed February 26, 2024)
Created December 11, 2007, Updated February 19, 2017