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Surface and Bulk Chemistry of Chemically Amplified Photoresists: Segregation in Thin Films and Environmental Stability Issues

Published

Author(s)

E Jablonski, Vivek Prabhu, S Sambasivan, Daniel A. Fischer, Eric K. Lin, D L. Goldfarb, M Angelopolous, H Ito
Proceedings Title
Proceedings of SPIE
Volume
5376
Conference Dates
February 1, 2004
Conference Location
Santa Clara, CA, US
Conference Title
SPIE Advanced Lithography

Keywords

airborne molecular contaminants, blend miscibility, NEXAFS

Citation

Jablonski, E. , Prabhu, V. , Sambasivan, S. , Fischer, D. , Lin, E. , Goldfarb, D. , Angelopolous, M. and Ito, H. (2004), Surface and Bulk Chemistry of Chemically Amplified Photoresists: Segregation in Thin Films and Environmental Stability Issues, Proceedings of SPIE, Santa Clara, CA, US, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=852294 (Accessed July 22, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created August 31, 2004, Updated October 12, 2021