Prabhu, V.
, Sambasivan, S.
, Fischer, D.
, Sundberg, L.
and Allen, R.
(2006),
Quantitative depth profiling of photoacid generators in photoresist materials by near-edge x-ray absorption fine structure spectroscopy, Applied Surface Science, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=854199
(Accessed December 12, 2024)
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Quantitative depth profiling of photoacid generators in photoresist materials by near-edge x-ray absorption fine structure spectroscopy
Published
Author(s)
, S Sambasivan, , Linda K. Sundberg, Robert D. Allen
Citation
Applied Surface Science
Volume
253
Issue
2
Pub Type
Journals
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Citation
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If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created November 15, 2006, Updated February 19, 2017