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Quantitative depth profiling of photoacid generators in photoresist materials by near-edge x-ray absorption fine structure spectroscopy

Published

Author(s)

Vivek M. Prabhu, S Sambasivan, Daniel A. Fischer, Linda K. Sundberg, Robert D. Allen
Citation
Applied Surface Science
Volume
253
Issue
2

Citation

Prabhu, V. , Sambasivan, S. , Fischer, D. , Sundberg, L. and Allen, R. (2006), Quantitative depth profiling of photoacid generators in photoresist materials by near-edge x-ray absorption fine structure spectroscopy, Applied Surface Science, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=854199 (Accessed February 22, 2024)
Created November 15, 2006, Updated February 19, 2017