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Search Publications by: James K. Olthoff (Fed)

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Displaying 26 - 50 of 136

Electron Interactions with CF 3 I

January 1, 2000
Author(s)
Loucas G. Christophorou, James K. Olthoff
Low-energy electron collision data for the plasma processing gas CF 3I are sparse. Limited cross section data are available only for total and differential elastic electron scattering, electron-impact ionization, and electron attachment processes. These

Electron Interactions With SF 6

January 1, 2000
Author(s)
Loucas G. Christophorou, James K. Olthoff
Sulfur hexafluoride (SF 6) is commonly used as a gaseous dielectric and as a plasma etching gas. In this work, the state of knowledge on electron-interaction cross sections and electron-swarm parameters in SF 6 is comprehensively reviewed and critically

Ion-Molecule Reactions and Ion Energies in CF 4 Discharges

December 1, 1999
Author(s)
B. Peko, I. V. Dyakov, R. Champion, MVVS. Rao, James K. Olthoff
Absolute cross sections have been measured for reactants typically found in carbon tetrafluoride (CF 4) discharges for collision energies below a few hundred electron volts. The reactions investigated include collision-induced dissociation and dissociative

Electron Collision Cross Sections Derived from Critically Assessed Data

July 1, 1999
Author(s)
Loucas G. Christophorou, James K. Olthoff
Electron-molecule collisions are among the most fundamental processes in gas discharges. They are also the precursors of the ions and the radicals which drive the etch, cleaning, or deposition processes in plasma reactors. Hence, there is a need for a

Negative Ion-Neutral Reactions in Townsend Discharges

July 1, 1999
Author(s)
James K. Olthoff, MVVS. Rao
Relative intensities and translational ion-flux energy distributions are presented for negative ions sampled from Townsend discharges in O 2, SF 6, and CF 4 for a high range of density reduced electric fields greater than 2 W 10 -18 V m 2 (> 2 kTd). These

Studies of Ion Bombardment in High Density Plasmas Containing CF 4

July 1, 1999
Author(s)
James K. Olthoff, Yicheng Wang
We report ion energy distributions, relative ion intensities, and absolute total ion current densities at the grounded electrode of an inductively coupled Gaseous Electronics Conference radio-frequency reference cell for discharges generated in pure C 4

Electron Drift and Attachment in CHF 3 and its Mixtures With Argon

May 1, 1999
Author(s)
Yicheng Wang, Loucas G. Christophorou, James K. Olthoff, J. K. Verbrugge
Measurements are reported of the electron drift velocity, w, in CHF 3 gas and in its mixtures with argon. The E/N dependence of w in the mixtures exhibits regions of distinct negative differential conductivity. A small electron attachment rate constant (-

Electron Interactions With Cl 2

April 1, 1999
Author(s)
Loucas G. Christophorou, James K. Olthoff
Low energy electron interactions with the Cl 2 molecule are reviewed. Information is synthesized and assessed on the cross sections for total electron scattering, total rotational excitation, total elastic electron scattering, momentum transfer, total

Total Electron Scattering Cross Section for Cl 2

January 1, 1999
Author(s)
Gary D. Cooper, Jason E. Sanabia, J. H. Moore, James K. Olthoff, Loucas G. Christophorou
Absolute measurements of the total electron scattering cross section for chlorine, Cl2, are reported for electron energies ranging from .3 eV to 23 eV. The present data are in reasonable agreement with previous measurements of the cross sections for total

A Search for Possible 'Universal-Applications' Gas Mixtures

December 1, 1998
Author(s)
Loucas G. Christophorou, James K. Olthoff, David S. Green
In an effort to respond to the recent concerns over the possible impact of SF 6 on global warming, we have searched for an SF 6 substitute gas that could be used in high voltage equipment instead of pure SF 6, with minimal changes in practice, operation