Christophorou, L.
and Olthoff, J.
(2000),
Electron Interactions with CF<sub>3</sub>I, J. Phys. & Chem. Ref. Data (JPCRD), National Institute of Standards and Technology, Gaithersburg, MD, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=26781
(Accessed October 17, 2025)
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Electron Interactions with CF3I
Published
Author(s)
Loucas G. Christophorou,
Abstract
Low-energy electron collision data for the plasma processing gas CF3I are sparse. Limited cross section data are available only for total and differential elastic electron scattering, electron-impact ionization, and electron attachment processes. These data are synthesized, assessed, and discussed in this paper. There is a need for further scrutiny of these data and for measurements of the cross sections of the other main electron-collision processes. There is a need also for measurements of the electron transport, ionization, and attachment coefficients of this moleculeCitation
J. Phys. & Chem. Ref. Data (JPCRD) -
Volume
29
Issue
4
NIST Pub Series
Pub Type
NIST Pubs
Download Paper
Keywords
CF<sub>3</sub>I, electron interactions, trifluoroiodomedthane
Citation
Issues
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Created December 31, 1999, Updated October 12, 2021