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Studies of Ion Bombardment in High Density Plasmas Containing CF4

Published

Author(s)

James K. Olthoff, Yicheng Wang

Abstract

We report ion energy distributions, relative ion intensities, and absolute total ion current densities at the grounded electrode of an inductively coupled Gaseous Electronics Conference radio-frequency reference cell for discharges generated in pure C4, and in CF4: Ar and CF4:O2:Ar mixtures. Abundant ionic species, including secondary ions such as CO+ and COF+, were observed and their implications are discussed.
Citation
Journal of Vacuum Science and Technology A
Issue
4

Keywords

carbon tetrafluoride, CF<sub>4</sub>, cleaning plasmas, etching plasmas, inductively coupled plasmas, ion energy distributions, ion flux

Citation

Olthoff, J. and Wang, Y. (1999), Studies of Ion Bombardment in High Density Plasmas Containing CF<sub>4</sub>, Journal of Vacuum Science and Technology A, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=6462 (Accessed May 19, 2024)

Issues

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Created June 30, 1999, Updated October 12, 2021