Olthoff, J.
and Wang, Y.
(1999),
Studies of Ion Bombardment in High Density Plasmas Containing CF<sub>4</sub>, Journal of Vacuum Science and Technology A, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=6462
(Accessed September 14, 2024)
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Studies of Ion Bombardment in High Density Plasmas Containing CF4
Published
Author(s)
,
Abstract
We report ion energy distributions, relative ion intensities, and absolute total ion current densities at the grounded electrode of an inductively coupled Gaseous Electronics Conference radio-frequency reference cell for discharges generated in pure C4, and in CF4: Ar and CF4:O2:Ar mixtures. Abundant ionic species, including secondary ions such as CO+ and COF+, were observed and their implications are discussed.Citation
Journal of Vacuum Science and Technology A
Issue
4
Pub Type
Journals
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Keywords
carbon tetrafluoride, CF<sub>4</sub>, cleaning plasmas, etching plasmas, inductively coupled plasmas, ion energy distributions, ion flux
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Created June 30, 1999, Updated October 12, 2021