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Electron Drift and Attachment in CHF3 and its Mixtures With Argon



Yicheng Wang, Loucas G. Christophorou, James K. Olthoff, J. K. Verbrugge


Measurements are reported of the electron drift velocity, w, in CHF3 gas and in its mixtures with argon. The E/N dependence of w in the mixtures exhibits regions of distinct negative differential conductivity. A small electron attachment rate constant (- 13 X 10-14 cm3 s-1 for density-reduced electric fields, E/N < 50 x 10-17 V cm2) has been measured, which may be due to impurities.
Chemical Physics Letters


CHF<sub>3</sub>, electron attachment, electron drift velocity, electron transport


Wang, Y. , Christophorou, L. , Olthoff, J. and Verbrugge, J. (1999), Electron Drift and Attachment in CHF<sub>3</sub> and its Mixtures With Argon, Chemical Physics Letters, [online], (Accessed May 28, 2024)


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Created April 30, 1999, Updated October 12, 2021