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Electron Drift and Attachment in CHF3 and its Mixtures With Argon

Published

Author(s)

Yicheng Wang, Loucas G. Christophorou, James K. Olthoff, J. K. Verbrugge

Abstract

Measurements are reported of the electron drift velocity, w, in CHF3 gas and in its mixtures with argon. The E/N dependence of w in the mixtures exhibits regions of distinct negative differential conductivity. A small electron attachment rate constant (- 13 X 10-14 cm3 s-1 for density-reduced electric fields, E/N < 50 x 10-17 V cm2) has been measured, which may be due to impurities.
Citation
Chemical Physics Letters

Keywords

CHF<sub>3</sub>, electron attachment, electron drift velocity, electron transport

Citation

Wang, Y. , Christophorou, L. , Olthoff, J. and Verbrugge, J. (1999), Electron Drift and Attachment in CHF<sub>3</sub> and its Mixtures With Argon, Chemical Physics Letters, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=20509 (Accessed May 28, 2024)

Issues

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Created April 30, 1999, Updated October 12, 2021