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PUBLICATIONS

Electron Drift and Attachment in CHF3 and its Mixtures With Argon

Published

Author(s)

Yicheng Wang, Loucas G. Christophorou, James K. Olthoff, J. K. Verbrugge

Abstract

Measurements are reported of the electron drift velocity, w, in CHF3 gas and in its mixtures with argon. The E/N dependence of w in the mixtures exhibits regions of distinct negative differential conductivity. A small electron attachment rate constant (- 13 X 10-14 cm3 s-1 for density-reduced electric fields, E/N < 50 x 10-17 V cm2) has been measured, which may be due to impurities.
Citation
Chemical Physics Letters
Pub Type
Journals

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Keywords

CHF<sub>3</sub>, electron attachment, electron drift velocity, electron transport
Electronics and Advanced communications

Citation

Wang, Y. , Christophorou, L. , Olthoff, J. and Verbrugge, J. (1999), Electron Drift and Attachment in CHF<sub>3</sub> and its Mixtures With Argon, Chemical Physics Letters, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=20509 (Accessed October 17, 2025)

Issues

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Created April 30, 1999, Updated October 12, 2021
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