Electron Drift and Attachment in CHF3 and its Mixtures With Argon
Yicheng Wang, Loucas G. Christophorou, James K. Olthoff, J. K. Verbrugge
Measurements are reported of the electron drift velocity, w, in CHF3 gas and in its mixtures with argon. The E/N dependence of w in the mixtures exhibits regions of distinct negative differential conductivity. A small electron attachment rate constant (- 13 X 10-14 cm3 s-1 for density-reduced electric fields, E/N < 50 x 10-17 V cm2) has been measured, which may be due to impurities.
, Christophorou, L.
, Olthoff, J.
and Verbrugge, J.
Electron Drift and Attachment in CHF<sub>3</sub> and its Mixtures With Argon, Chemical Physics Letters, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=20509
(Accessed December 5, 2023)