Wang, Y.
, Christophorou, L.
, Olthoff, J.
and Verbrugge, J.
(1999),
Electron Drift and Attachment in CHF<sub>3</sub> and its Mixtures With Argon, Chemical Physics Letters, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=20509
(Accessed October 11, 2024)
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Electron Drift and Attachment in CHF3 and its Mixtures With Argon
Published
Author(s)
, Loucas G. Christophorou, , J. K. Verbrugge
Abstract
Measurements are reported of the electron drift velocity, w, in CHF3 gas and in its mixtures with argon. The E/N dependence of w in the mixtures exhibits regions of distinct negative differential conductivity. A small electron attachment rate constant (- 13 X 10-14 cm3 s-1 for density-reduced electric fields, E/N < 50 x 10-17 V cm2) has been measured, which may be due to impurities.Citation
Chemical Physics Letters
Pub Type
Journals
Download Paper
Keywords
CHF<sub>3</sub>, electron attachment, electron drift velocity, electron transport
Citation
Issues
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Created April 30, 1999, Updated October 12, 2021