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Ion Energy Distributions and Sheath Voltages in Radio-Frequency-Biased, Inductively Coupled, High-Density Plasma Reactor

Published

Author(s)

Mark A. Sobolewski, James K. Olthoff, Yicheng Wang
Citation
Journal of Applied Physics
Volume
85
Issue
8

Citation

Sobolewski, M. , Olthoff, J. and Wang, Y. (1999), Ion Energy Distributions and Sheath Voltages in Radio-Frequency-Biased, Inductively Coupled, High-Density Plasma Reactor, Journal of Applied Physics, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=23723 (Accessed April 21, 2024)
Created March 31, 1999, Updated October 12, 2021