Christophorou, L.
and Olthoff, J.
(2000),
Electron Interactions With SF<sub>6</sub>, J. Phys. & Chem. Ref. Data (JPCRD), National Institute of Standards and Technology, Gaithersburg, MD, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=7801
(Accessed October 13, 2024)
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Electron Interactions With SF6
Published
Author(s)
Loucas G. Christophorou,
Abstract
Sulfur hexafluoride (SF6) is commonly used as a gaseous dielectric and as a plasma etching gas. In this work, the state of knowledge on electron-interaction cross sections and electron-swarm parameters in SF6 is comprehensively reviewed and critically assessed. Cross sections are presented and discussed for the following scattering processes: total electron scattering; differential elastic; elastic integral; elastic momentum; total vibrational; total and partial ionization; total dissociative and nondissociative electron attachment; dissociation into neutrals. Coefficients for electron-impact ionization, effective ionization, electron attachment , electron drift, and electron diffusion are also reviewed and assessed.Citation
J. Phys. & Chem. Ref. Data (JPCRD) -
Volume
29
Issue
3
NIST Pub Series
Pub Type
NIST Pubs
Download Paper
Keywords
coefficients, cross sections, electron scattering, electron swarms, electron transport, ionization, SF6, sulfur hexafluoride
Citation
Issues
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Created December 31, 1999, Updated October 12, 2021