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Manufacturing

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Displaying 2051 - 2075 of 2179

Improved Photomask Metrology Through Exposure Emulation

July 1, 1995
Author(s)
James E. Potzick
The ultimate purpose of the photomask in IC manufacture is to define the image to be printed on a silicon wafer. Of the many factors which affect this aerial image in the wafer stepper, some are properties of the stepper projection system and some are

In Situ Testing and Calibrating of Z-Piezo of an Atomic Force Microscope

July 1, 1995
Author(s)
Joseph Fu
By scanning a slightly tilted, smooth surface with an atomic force microscope (AFM), it is possible to obtain hysteresis loops which contain information on the nonlinearity and hysteresis in the z axis of the AFM''s piezoelectric actuator. A 15% variation

Nanofabrication of a two-dimensional array using laser-focused atomic deposition

June 27, 1995
Author(s)
R Gupta, Robert Celotta, Zeina J. Kubarych, J Mcclelland
Fabrication of a two-dimensional array of nanometer-scale chromium features on a silicon substrate by laser-focused atomic deposition is described. Features 13? 1 nm high and having a full-width at half maximum of 80? 10 nm are fabricated in a square array

NIST SRM 9983 High Rigidity Ball-Bar Stand User Manual

June 1, 1995
Author(s)
Daniel S. Sawyer, Steven D. Phillips, Gregory W. Caskey, Bruce R. Borchardt, David E. Ward, P Snoots
This document is the user manual for the NIST SRM 9983 High Rigidity Ball Bar Stand. The manual contains a list of the components that are included as part of the unit. Complete instructions for setting up and assembling the stand to support a ball bar for

The Gage Block Handbook

June 1, 1995
Author(s)
Theodore D. Doiron, John S. Beers
Gage blocks are the primary method used by industry to standardize the measurement of dimension. This work discusses every aspect of gage block calibration, including definitions, characteristics of gage blocks, calibration by interferometry and mechanical

Metrology with the Ultraviolet Scanning Transmission Microscope

May 1, 1995
Author(s)
Richard M. Silver, James E. Potzick, Y Hu
A novel design for an ultraviolet critical dimension measurement transmission microscope utilizing the Stewart platform as the rigid main structure has been implemented. This new design shows improved vibration characteristics and is able to accommodate

Overlay Measurements and Standards

May 1, 1995
Author(s)
Richard M. Silver, James E. Potzick, Robert D. Larrabee
The relative misalignment of features produced by different mask levels (i.e., overlay error) is projected to become an increasingly important problem to the semiconductor industry as the size of the critical features continues to decrease. In response to

Re-Evaluation of the Accuracy of NIST Photomask Linewidth Standards

May 1, 1995
Author(s)
James E. Potzick
Every artifact measurement standard has some uncertainty associated with its calibration, and the NIST Photomask Linewidth Standards are no exception. This uncertainty is caused by a combination of those factors which influence the calibration measurement

Interim testing artifact (ITA) : a performance evaluation system for coordinate measuring machines (CMMs) : user manual

February 1, 1995
Author(s)
Amy Singer, J Land, Steven D. Phillips, Daniel S. Sawyer, Bruce R. Borchardt, Gregory W. Caskey, D Ward, P Snoots, B Faust
The Interim Testing Artifact (ITA) is designed to quickly test CMMs for performance problems so that they can be repaired before significant numbers of good parts are erroneously rejected (or bad parts accepted) by the CMM. Frequent testing using the ITA

Microform Calibrations in Surface Metrology

February 1, 1995
Author(s)
Jun-Feng Song, F Rudder, Theodore V. Vorburger, A Hartman, Brian R. Scace, J Smith
Microform calibrations include the measurement of complex profile forms and position errors of micrometer scale in combination with the measurement of deviations from a specified profile and surface texture of profile segments. Tolerances on the profile

The Estimation of Measurement Uncertainty of Small Circular Features Measured by CMMs

February 1, 1995
Author(s)
Steven D. Phillips, Bruce R. Borchardt, William T. Estler
This paper examines the measurement uncertainty of small circular features as a function of the sampling strategy, i.e., the number and distribution of measurement points. Specifically, we examine measuring a circular feature using a three-point sampling

A Metrology Approach to Unifying Rockwell C Hardness Scales

January 1, 1995
Author(s)
Jun-Feng Song, J Smith, Theodore V. Vorburger
Current Rockwell C hardness scales (HRC) are unified by performance comparisons. Unless a reliable metrology approach is used for the direct verification of standard hardness machines and diamond indenters, the unified hardness scale may exhibit a

Automated Calibration of Scanning Probe Microscopy by Image Processing

January 1, 1995
Author(s)
J Jorgensen
The continuing drive within high technology industries to push dimensional tolerances to still smaller values motivates the use of surface measuring techniques with better resolution. This requirement can be met by the scanning probe microscopy (SPM)

Calibration Uncertainties for Microform of Rockwell Hardness Indenters

January 1, 1995
Author(s)
F Rudder, Jun-Feng Song
A microform calibration procedure has been developed at NIST to certify geometric conformity of Rockwell C hardness indenters. The interest in microform calibrations is to unify national and international comparisons of hardness tests. Using accepted
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