Performance of the Prototype NIST SRM 2090A SEM Magnification Standard in a Low-Acclerating Voltage SEM

Published

May 22, 1995

Author(s)

B Newell, Michael T. Postek, J VanDerZiel

Abstract

A new NIST SEM magnification calibration standard has been fabricated and characterized in production prototype form. The SRM 2090A samples contain structures ranging in pitch from 3000 um to 0.2 um and are useful at both high and low accelerating voltages. The design and fabrication of the samples has incorporated many of the improvements suggested through two previous prototype series. Since the low-accelerating voltage, critical-dimension measurement scanning electron microscope has assumed an important in modern semiconductor process control, we investigate the use and performance of the samples in a representative instrument. Scan area contamination form a prolonged high magnification scan is shown to be a significant issue. A cleaning procedure developed for a previous prototype series has been modified to obtain acceptable results on the present samples.

Proceedings Title

Proceedings of SPIE

Volume

2439

Conference Dates

February 20, 1995

Conference Location

Santa Clara, CA, USA

Conference Title

Integrated Circuit Metrology, Inspection, and Process Control IX, Marylyn H. Bennett, Editor, May 1995, SEM Meetrology II

Pub Type

Conferences

Keywords

calibration, CD-SEM, contamination, electron beam lithography, SRM 2090A

Citation

Newell, B. , Postek, M. and VanDerZiel, J. (1995), Performance of the Prototype NIST SRM 2090A SEM Magnification Standard in a Low-Acclerating Voltage SEM, Proceedings of SPIE, Santa Clara, CA, USA (Accessed July 16, 2026)

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