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Performance of the Prototype NIST SRM 2090A SEM Magnification Standard in a Low-Acclerating Voltage SEM

Published

Author(s)

B Newell, Michael T. Postek, J VanDerZiel

Abstract

A new NIST SEM magnification calibration standard has been fabricated and characterized in production prototype form. The SRM 2090A samples contain structures ranging in pitch from 3000 um to 0.2 um and are useful at both high and low accelerating voltages. The design and fabrication of the samples has incorporated many of the improvements suggested through two previous prototype series. Since the low-accelerating voltage, critical-dimension measurement scanning electron microscope has assumed an important in modern semiconductor process control, we investigate the use and performance of the samples in a representative instrument. Scan area contamination form a prolonged high magnification scan is shown to be a significant issue. A cleaning procedure developed for a previous prototype series has been modified to obtain acceptable results on the present samples.
Proceedings Title
Proceedings of SPIE
Volume
2439
Conference Dates
February 20, 1995
Conference Location
Santa Clara, CA, USA
Conference Title
Integrated Circuit Metrology, Inspection, and Process Control IX, Marylyn H. Bennett, Editor, May 1995, SEM Meetrology II

Keywords

calibration, CD-SEM, contamination, electron beam lithography, SRM 2090A

Citation

Newell, B. , Postek, M. and VanDerZiel, J. (1995), Performance of the Prototype NIST SRM 2090A SEM Magnification Standard in a Low-Acclerating Voltage SEM, Proceedings of SPIE, Santa Clara, CA, USA (Accessed May 20, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created May 21, 1995, Updated October 12, 2021