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A computer model and methodology for modeling optical mixing errors in heterodyne interferometers is presented. The model is based on the Jones calculus and uses a matrix formalism to eliminate simplifications and reduce assumptions in the model. The model
Studies have been carried out to determine the influence of different chemical environments and tool shapes on damage produced during diamond tool scratching and indenting of two advanced ceramics: chemical-vapor-deposited silicon carbide and a composite
As increasing number of economically important products manufactured by U.S. companies are comprised of assemblies of macroscopic parts with microscopic tolerances, that is, parts from a few to hundreds of millimeters in size where the acceptable
J Smith, Jun-Feng Song, F Rudder, Theodore V. Vorburger
Based on the Rockwell diamond indenter's microform calibrations recently developed at NIST, as well as a deadweight standardized Rockwell hardness machine, the NIST Rockwell hardness standard calibration has been established. Our approach makes it possible
Nitin P. Padture, Christopher J. Evans, Hockin D. Xu, Brian R. Lawn
The machinability of a heterogeneous silicon carbide with weak interphase boundaries, elongated grains, and high internal stresses is evaluated relative to a homogeneous control material with a well-bonded, equiaxed, and unstressed grain structure
William T. Estler, Steven D. Phillips, Bruce R. Borchardt, Ted Hopp, Christoph J. Witzgall, M Levenson, et al
We present the analysis of a simple mechanical model of a common type of kinematic seat touch trigger probe widely used on modem coordinate measuring machines (CMMs). The model provides a quantitative description of the pre-travel variation or probe lobing
The use of special machine tools with single-crystal diamond-cutting tools to produce metal optics is called diamond turning. The manufacture of optical surfaces by diamond turning is relatively new compared to the traditional optical-polishing methods. In
This study investigated the performance and wear behavior of different cubic boron nitride (CBN) tools in finish turning of hardened 52100 steels. Tool performance was evaluated based on surface finish and flank wear land width. Wear mechanisms of CBN
J Schneir, John S. Villarrubia, T Mcwaid, V W. Tsai, Ronald G. Dixson
Atomic force microscopes are being used increasingly for process metrology. As a case study, the measurement by atomic force microscope of a soda lime glass optical disk patterned using optical lithography and reactive plasma etching is examined. The
S Jahanmir, T W. Hwang, Eric P. Whitenton, S Job, Christopher J. Evans
Using an instrumented surface grinder, the two components of grinding forces (normal and tangential) were measured for different types of silicon nitride ceramics. The influences of grinding parameters, such as down feed and table speed, and grinding
L Linholm, Robert Allen, Michael W. Cresswell, Rathindra Ghoshtagore, S Mayo, H Schafft, John A. Kramar
The results from high-quality electrical and physical measurements on the same cross-bridge resistor test structure with approximately vertical sidewalls have shown differences in linewidth as great as 90 nm for selected conductive films. These differences
An improved method for temporarily converting long gage blocks into line scales is described. The new process employs fused silica rather than previously used steel conversion gage blocks. Conversion blocks are pairs of small (13 mm) gage blocks with
The subject of coordinate measuring machine (CMM) evaluation is a broad an multifaceted one. The theme of this chapter is the evaluation of CMM measurement uncertainty which is central to the concept of traceability. This chapter elucidates the sources of
Ralph C. Veale, Edgar G. Erber, Bruce R. Borchardt
The reference datum for a screw thread is the pitch diameter cylinder. Although a defined method within the United states for pitch diameter measurement exists, it does not follow worldwide procedures, and the complexity and uncertainties associated with
Progress since the last Industrial Applications of Scanned Probe Microscopy workshop in the estimation of tip geometries for scanned probe microscopes is discussed. A new method which does not require calibration of the tip characterizers has been
An attitude has developed that the results of any SEM measurement arc absolutely true. If this were the case, there would be no need for standards and no metrological problems would exist in making submicrometer measurements. Multiple, basic errors
The scattering of a plane monochromatic wave by an infinite dielectric wedge is discussed for arbitrary direction of incidence and polarization. Two sets of coupled integral equations for an unknown surface function are derived. The behavior of the fields
Direct patterning of a semiconductor surface to produce an ultrathin oxide mask has proven to be a promising approach for integrating lithographic methods based on scanned probe microscopy (SPM) into existing electronics device processing. The resulting
The Second Workshop on Industrial Applications of Scanned Probe Microscopy (IASPM) was held at the National Institute of Standards and Technology (NIST) Gaithersburg on May 2-3, 1995. The meeting, co-sponsored by NIST, SEMATECH, the American Society for
The Algorithm Testing System (ATS) is a software system which supports the Algorithm Testing & Evaluation Program: for Coordinate Measuring Systems (ATEP-CMS). ATEP-CMS is a NIST special test service for evaluating the performance of CMS geometric fitting
This user's manual is a guide to the FORTRAN code MONSEL-I which is a Monte Carlo simulation of the transmitted and backscattered electron signals in a scanning electron microscope (SEM) associated with a line specimen with a trapezoidal cross section. The
Different working standards and check standards are used in the NIST surface and microform measurement laboratory for calibrating instruments, establishing measurement traceability and control measurement uncertainty. The basic requirements for these
Michael T. Postek, Andras Vladar, G Banke, T Reilly
An accurate electron beam model is primary to the understanding of the SEM image. Several independently developed Monte Carlo models have been introduced for this purpose and a modeling round-robin has just been conducted to compare the results of these