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S Z. Zahwi, M F. Koura, Thomas Brian Renegar, A M. Mekawi
During 1982-1985, a cooperative project was made between the National Bureau of Standards (NBS) at that time (now National Institute of Standards and Technology
The application of power-driven machinery to manufacturing and other areas of human endeavor characterized the Industrial Revolution in the 18th and 19th
We describe National Institute of Standards and Technology research on wavelength standards for the optical communications L-band. We are developing a pair of
Sae Woo Nam, David A. Wollman, Dale Newbury, Gene C. Hilton, Kent D. Irwin, David A. Rudman, Steven Deiker, Norman F. Bergren, John M. Martinis
The high performance of single-pixel microcalorimeter EDS (υcal EDS) has been shown to be very useful for a variety of microanalysis cases. The primary
We present our analysis of the nose-to-nose (ntn) method for use as an accurate sampler calibration method. The variations in the measurement of the sampler
We describe micro cantilevers developed for in-situ measurements of ultra-thin ferromagnetic films. The cantilevers are optimized for use in a resonating torque
Measuring voice quality for telephony is not a new problem. However, packet-switched, best-effort networks such as the Internet present significant new
Alpesh Bhobe, Christopher L. Holloway, Melinda Piket-May
Full wave finite-difference time-domain (FDTD) and a simplified 1D- finite-difference time-domain technique using the multi-conductor transmission line
Is the measurement of performance for intelligent systems different than that of non-intelligent systems? In this white paper, we explore the various dimensions
We demonstrate the application of small angle neutron scattering (SANS) measurements for the quick, nondestructive, and quantitative measurement of the feature
The total luminous flux (lumen) is one of the most important characteristics of Light Emitting Diodes (LEDs), and is commonly measured using integrating sphere
NIST has a long-standing program for the calibration of extreme ultraviolet optical components. Begun with the advent of the Synchrotron Ultraviolet Radiation
Most applications of synchrotron radiation are not very sensitive to source intensity fluctuations. Fourier-transform spectroscopy, however, is very sensitive
New fluorescent lamp designs employ Hg-Ar discharges under operating conditions that differ significantly from those found in conventional fluorescent tubes. We
Lori S. Goldner, K D. Weston, W F. Heinz, Jeeseong Hwang, E S. DeJong, John P. Marino
The technology to rapidly manipulate and screen individual molecules lies at the frontier of measurement science and impacts emerging bio- and nano-technologies
Traceable linewidth measurements of tiny features on photomasks and wafers present interesting challenges. Usually technical solutions exist for the problems
Arthur H. Fanney, Brian P. Dougherty, Mark W. Davis
The photovoltaic industry is experiencing rapid growth. Industry analysts project that photovoltaic sales will increase from their current $1.5 billion level to
Richard M. Silver, Jay S. Jun, Edward A. Kornegay, R Morton
Accurate overlay measurements rely on robust, repeatable, and accurate feature position determination. In our effort to develop traceable we have examined a
The widespread use of building integrated photovoltaics appears likely as a result of the continuing decline in photovoltaic manufacturing costs, the relative
Andras Vladar, Michael T. Postek, Nien F. Zhang, Robert D. Larrabee, Samuel N. Jones, Russell E. Hajdaj
All scanning electron microscope-based inspection instruments, whether they are in a laboratory or on the production line, slowly lose their performance and
Christopher J. Evans, R E. Parks, L Z. Shao, Tony L. Schmitz, Angela Davies
Conventional interferometric testing of the flatness of photomask blanks is rendered difficult by the long coherence length of the HeNe laser sources typically
John S. Villarrubia, Andras Vladar, J R. Lowney, Michael T. Postek
In a scanning electron microscope (SEM) top-down secondary electron image, areas within a few tens of nanometers of the line edges arc characteristically
Andras Vladar, Michael T. Postek, Nien F. Zhang, Robert D. Larrabee, Samuel N. Jones, Russell E. Hajdaj
Reference Material (RM 8091) is intended primarily for use in checking the sharpness performance of scanning electron microscopes. It is supplied as a small
The vacuum system of all scanning electron microscopes (SEMs), even in the so-called clean instruments, have certain hydrocarbon residues that the vacuum pumps
John A. Dagata, F S. Chien, S Gwo, K Morimoto, T Inoue, J Itoh, H Yokoyama
Carbon nanotube tips offer a significant improvement over standard scanned probe microscope (SPM) tips for electrical characterization of nanodevice structures
Most would assume that the characterization of electronic display quality would be a straightforward process offering few complications. However, what the eye
Ronald G. Dixson, Ndubuisi G. Orji, Joseph Fu, V W. Tsai, E. C. Williams, Theodore V. Vorburger, H Edwards, D Cook, P West, R Nyffenegger
Atomic force microscopes (AFMs) are used in the semiconductor industry for a variety of metrology purposes. Step height measurements at the nanometer level and