Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Reference Material 8091: New Scanning Electron Microscope Sharpness Standard

Published

Author(s)

Andras Vladar, Michael T. Postek, Nien F. Zhang, Robert D. Larrabee, Samuel N. Jones, Russell E. Hajdaj

Abstract

All scanning electron microscope-based inspection instruments, whether they are in a laboratory or on the production line, slowly lose their performance and then the instrument is no longer capable of providing as good quality, sharp images as before. This loss of performance is related to changes in the electron source, in the alignment of the electron-optical column, astigmatism , and to sample and electron optical column contamination. Detecting a loss in image sharpness easily reveals this decrease of performance. Reference Material (RM) 8091 is intended primarily for routinely checking the performance of scanning electron microscopes. RM 8091 is designed for use in conjunction with Fourier analysis software like the NIST/SPECTER SEM Monitor Program, the NIST Kurtosis program, or the University of Tennessee SMART program. This RM is supplied as a small, approximately 2 mm ? 2 mm diced semiconductor chip. It is meant to be mounted on to a so-called drop-in wafer for specialized, wafer inspection or dimensional metrology SEMs or put on a specimen stub for insertion into laboratory scanning electron microscopes. This Reference Material is fully compatible with state-of-the-art integrated circuit technology.
Proceedings Title
Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography XV, Neal T. Sullivan, Editor
Volume
4344
Conference Dates
February 26, 2001
Conference Location
Santa Clara, CA
Conference Title
Poster Session

Keywords

CD, CD-SEM, measurement, metrology, performance, reference material, scanning electron microscope, SEM, standard

Citation

Vladar, A. , Postek, M. , Zhang, N. , Larrabee, R. , Jones, S. and Hajdaj, R. (2001), Reference Material 8091: New Scanning Electron Microscope Sharpness Standard, Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography XV, Neal T. Sullivan, Editor, Santa Clara, CA (Accessed June 22, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created August 1, 2001, Updated February 19, 2017